G03F 7/70653
Metrology techniques
Official title: {Metrology techniques}
G03F7/70653 (Metrology techniques) appears on 488 US grants and 519 published applications in this corpus.
Search patents in G03F- Granted patents
- 488
- Published applications
- 519
- Assignees
- 129
- Inventors
- 1,112
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 8 | 0 |
| 1995 | 9 | 0 |
| 1996 | 6 | 0 |
| 1997 | 14 | 0 |
| 1998 | 17 | 0 |
| 1999 | 16 | 0 |
| 2000 | 5 | 0 |
| 2001 | 7 | 1 |
| 2002 | 8 | 24 |
| 2003 | 9 | 15 |
| 2004 | 17 | 22 |
| 2005 | 17 | 25 |
| 2006 | 25 | 30 |
| 2007 | 14 | 18 |
| 2008 | 16 | 29 |
| 2009 | 16 | 21 |
| 2010 | 27 | 24 |
| 2011 | 27 | 24 |
| 2012 | 12 | 15 |
| 2013 | 22 | 14 |
| 2014 | 26 | 7 |
| 2015 | 11 | 13 |
| 2016 | 9 | 8 |
| 2017 | 13 | 15 |
| 2018 | 17 | 11 |
| 2019 | 16 | 14 |
| 2020 | 14 | 15 |
| 2021 | 9 | 10 |
| 2022 | 7 | 20 |
| 2023 | 8 | 30 |
| 2024 | 19 | 34 |
| 2025 | 19 | 54 |
| 2026 | 17 | 26 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Overlay measurement using balanced capacity targets29 Sep 2026US 12,748,354 B2ASML Netherlands B. V.
- Methods and systems for model-less, scatterometry based measurements of semiconductor structures22 Sep 2026US 12,743,027 B2KLA Corporation
- Mask inspection apparatus18 Aug 2026US 12,710,701 B2Stek Co., Ltd.
- Repeating noise suppression for array print check inspection8 Oct 2026US 2026/0310104 A1KLA Corporation
- Precise, High Throughput Optical Imaging Of Packaged Devices8 Oct 2026US 2026/0310105 A1
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
- Computer-implemented method and apparatus for processing a sample with a nanomanipulator17 Sep 2026US 2026/0277119 A1
- Systems and methods for multi-task baseline models in semiconductor metrology and inspection applications27 Aug 2026US 2026/0251983 A1Gauss Labs Inc.
Most cited
By later US patents
- Membrane dielectric isolation IC fabrication334US 6,008,126 AElm Technology Corporation · 1999
- Making and testing an integrated circuit using high density probe points307US 5,103,557 A1992
- Lithography device for semiconductor circuit pattern generator287US 7,242,012 B2Elm Technology Corporation · 2007
- Method of making a flexible tester surface for testing integrated circuits253US 5,020,219 A1991
- Methods and systems for determining a critical dimension and a thin film characteristic of a specimen248US 6,633,831 B2KLA-Tencor Technologies Corporation · 2003