G03F 7/70655
Non-optical
Official title: {Non-optical, e.g. atomic force microscope [AFM] or critical dimension scanning electron microscope [CD-SEM]}
G03F7/70655 (Non-optical) appears on 21 US grants and 69 published applications in this corpus.
Search patents in G03F- Granted patents
- 21
- Published applications
- 69
- Assignees
- 23
- Inventors
- 255
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 2 | 2 |
| 2016 | 0 | 1 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 1 | 1 |
| 2020 | 1 | 1 |
| 2021 | 1 | 2 |
| 2022 | 1 | 2 |
| 2023 | 0 | 8 |
| 2024 | 5 | 13 |
| 2025 | 4 | 26 |
| 2026 | 6 | 12 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Overlay measurement using balanced capacity targets29 Sep 2026US 12,748,354 B2ASML Netherlands B. V.
- Methods and systems for model-less, scatterometry based measurements of semiconductor structures22 Sep 2026US 12,743,027 B2KLA Corporation
- Method of performing metrology on a microfabrication pattern5 May 2026US 12,620,550 B2Imec Vzw
- Repeating noise suppression for array print check inspection8 Oct 2026US 2026/0310104 A1KLA Corporation
- Computer-implemented method and apparatus for processing a sample with a nanomanipulator17 Sep 2026US 2026/0277119 A1
- Systems and methods for multi-task baseline models in semiconductor metrology and inspection applications27 Aug 2026US 2026/0251983 A1Gauss Labs Inc.
- Method and apparatus with semiconductor process reliability measurement16 Jul 2026US 2026/0202758 A1Samsung Electronics Co., Ltd.
- Calibration method and apparatus9 Jul 2026US 2026/0194341 A1ASML Netherlands B. V.
Most cited
By later US patents
- Measurement method of overlay mark5US 9,007,571 B2United Microelectronics Corp. · 2015
- Performance optimized scanning sequence for eBeam metrology and inspection3US 11,209,737 B1KLA Corporation · 2021
- Charged particle beam device and overlay misalignment measurement method3US 9,224,575 B2Hitachi High-Technologies Corporation · 2015
- Method of forming optical proximity correction model and method of fabricating semiconductor device using the same1US 12,354,920 B2Samsung Electronics Co., Ltd. · 2025