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US 7,242,012 B2Granted
Lithography device for semiconductor circuit pattern generator
AssigneeElm Technology Corporation
InventorGlenn J Leedy
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AssigneeElm Technology Corporation
InventorGlenn J Leedy
Estimating the term…
General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor layer of the membrane. The semiconductor membrane layer is initially formed from a substrate of standard thickness, and all but a thin surface layer of the substrate is then etched or polished away. In another version, the flexible membrane is used as support and electrical interconnect for conventional integrated circuit die bonded thereto, with the interconnect formed in multiple layers in the membrane. Multiple die can be connected to one such membrane, which is then packaged as a multi-chip module. Other applications are based on (circuit) membrane processing for bipolar and MOSFET transistor fabrication, low impedance conductor interconnecting fabrication, flat panel displays, maskless (direct write) lithography, and 3D IC fabrication.
A method of making a lithography pattern generation apparatus having an array of exposure cells formed on a substrate, comprising integrating with said array control circuitry for controlling each exposure cell formed on said substrate, and further comprising providing over the substrate at least one elastic dielectric layer.
A lithography pattern generation device comprising:
A lithography tool comprising:
A method of making a lithography pattern generation apparatus having an array of exposure cells formed on a substrate, comprising integrating with said array control circuitry for controlling each exposure cell formed on said substrate, further comprising providing over the substrate at least one stress-controlled dielectric layer.
A lithography pattern generation device comprising:
A lithography tool comprising:
Dependencies are inferred from the claim text.