G03F 7/70675
Latent image, i.e. measuring the image of the exposed resist prior to
Official title: {Latent image, i.e. measuring the image of the exposed resist prior to development}
G03F7/70675 (Latent image, i.e. measuring the image of the exposed resist prior to) appears on 105 US grants and 78 published applications in this corpus.
Search patents in G03F- Granted patents
- 105
- Published applications
- 78
- Assignees
- 40
- Inventors
- 190
- Latest grant
- 3 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
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| 1994 | 4 | 0 |
| 1995 | 3 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 9 | 0 |
| 1999 | 5 | 0 |
| 2000 | 3 | 0 |
| 2001 | 1 | 1 |
| 2002 | 2 | 3 |
| 2003 | 4 | 4 |
| 2004 | 2 | 4 |
| 2005 | 4 | 5 |
| 2006 | 7 | 6 |
| 2007 | 3 | 3 |
| 2008 | 2 | 7 |
| 2009 | 3 | 2 |
| 2010 | 6 | 7 |
| 2011 | 4 | 2 |
| 2012 | 2 | 1 |
| 2013 | 2 | 3 |
| 2014 | 4 | 5 |
| 2015 | 2 | 3 |
| 2016 | 4 | 1 |
| 2017 | 3 | 5 |
| 2018 | 3 | 2 |
| 2019 | 3 | 1 |
| 2020 | 2 | 2 |
| 2021 | 1 | 0 |
| 2022 | 0 | 4 |
| 2023 | 2 | 6 |
| 2024 | 2 | 1 |
| 2025 | 3 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for repairing a defect of a lithographic mask3 Mar 2026US 12,566,370 B2Carl Zeiss SMT GmbH
- Method and system for predicting process information with a parameterized model9 Dec 2025US 12,493,247 B2ASML Netherlands B. V.
- Lithographic patterning method and system therefore17 Jun 2025US 12,332,574 B2Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Method for adjusting a target feature in a model of a patterning process based on local electric fields7 Jan 2025US 12,189,308 B2ASML Netherlands B. V.
- Determining pattern ranking based on measurement feedback from printed substrate16 Jul 2024US 12,038,694 B2ASML Netherlands B. V.
- Method and system for predicting process information with a parameterized model9 May 2024US 2024/0152060 A1ASML Netherlands B. V.
- Print element substrate and method for manufacturing print element substrate26 Oct 2023US 2023/0341762 A1Canon Kabushiki Kaisha
- Method for adjusting a target feature in a model of a patterning process based on local electric fields3 Aug 2023US 2023/0244151 A1ASML Netherlands B. V.
- Determining pattern ranking based on measurement feedback from printed substrate27 Jul 2023US 2023/0236512 A1ASML Netherlands B. V.
- Method and apparatus for repairing a defect of a lithographic mask18 May 2023US 2023/0152685 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992
- Method for controlling a line dimension arising in photolithographic processes101US 5,516,608 AInternational Business Machines Corporation · 1996
- Monitoring apparatus and method particularly useful in photolithographically processing substrates94US 6,166,801 ANova Measuring Instruments Ltd. · 2000
- Distortion inspecting method for projection optical system92US 5,402,224 ANikon Corporation · 1995
- Critical dimension monitoring from latent image61US 6,561,706 B2Advanced Micro Devices, Inc. · 2003