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AssigneeASML Netherlands B.V.
InventorsScott Anderson Middlebrooks, Patrick Warnaar, Patrick Philipp Helfenstein, Alexander Prasetya Konijnenberg, Maxim Pisarenco, Markus Gerardus Martinus Maria Van Kraaij
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A method and system for predicting complex electric field images with a parameterized model are described. A latent space representation of a complex electric field image is determined based on dimensional data in a latent space of the parameterized model for a given input to the parameterized model. The given input may be a measured amplitude (e.g., intensity) associated with the complex electric field image. The complex electric field image is predicted based on the latent space representation of the complex electric field image. The predicted complex electric field image includes an amplitude and a phase. The parameterized model comprises encoder-decoder architecture. In some embodiments, determining the latent space representation of the electric field image comprises minimizing a function constrained by a set of electric field images that could be predicted by the parameterized model based on the dimensional data in the latent space and the given input.
A computer-implemented method for improving metrology outputs during a semiconductor manufacturing process, comprising:
A metrology apparatus comprising one or more processors configured to perform operations comprising:
Dependencies are inferred from the claim text.