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AssigneeASML Netherlands B.V.
InventorsRichard Johannes Franciscus Van Haren, Leon Paul Van Dijk, Oktay Yildirim, Orion Jonathan Pierre Mouraille
Estimating the term…
A method for determining a target feature in a model of a patterning process based on local electric fields estimated for the patterning process. The method includes obtaining a mask stack region of interest. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The mask stack region of interest includes the target feature. The method includes estimating a local electric field based on the one or more characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest. The local electric field is estimated for a portion of the mask stack region of interest in proximity to the target feature. The method includes determining the target feature based on the estimated local electric field.
A method comprising:
A computer program product comprising a non-transitory computer readable medium having instructions recorded therein or thereon, the instructions, when executed by a computer system, configured to cause the computer system to at least:
A computer program product comprising a non-transitory computer readable medium having instructions recorded therein or thereon, the instructions, when executed by a computer system, configured to cause the computer system to at least:
Dependencies are inferred from the claim text.