G03F 7/70666
Aerial image, i.e. measuring the image of the patterned exposure light at
Official title: {Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system}
G03F7/70666 (Aerial image, i.e. measuring the image of the patterned exposure light at) appears on 218 US grants and 270 published applications in this corpus.
Search patents in G03F- Granted patents
- 218
- Published applications
- 270
- Assignees
- 61
- Inventors
- 473
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 2 |
| 2003 | 1 | 3 |
| 2004 | 2 | 6 |
| 2005 | 4 | 13 |
| 2006 | 13 | 21 |
| 2007 | 5 | 12 |
| 2008 | 8 | 17 |
| 2009 | 7 | 17 |
| 2010 | 13 | 13 |
| 2011 | 17 | 20 |
| 2012 | 10 | 11 |
| 2013 | 17 | 10 |
| 2014 | 21 | 3 |
| 2015 | 8 | 8 |
| 2016 | 4 | 6 |
| 2017 | 11 | 12 |
| 2018 | 17 | 10 |
| 2019 | 12 | 11 |
| 2020 | 9 | 9 |
| 2021 | 5 | 6 |
| 2022 | 4 | 10 |
| 2023 | 4 | 8 |
| 2024 | 8 | 8 |
| 2025 | 6 | 23 |
| 2026 | 5 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
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Most cited
By later US patents
- System and method for lithography simulation212US 7,003,758 B2Brion Technologies, Inc. · 2006
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