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US 5,795,688 AGranted
Process for detecting defects in photomasks through aerial image comparisons
AssigneeMicron Technology, Inc.
InventorsJames Burdorf, Christophe Pierrat
Life of this patent
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Abstract
The present invention provides a process for performing automatic inspection of advanced design photomasks. In a preferred embodiment, an aerial image of a portion of a photomask is generated. A simulated image corresponding to original pattern data is also generated. The aerial image and simulated image are then compared and discrepancies are detected as possible defects.
Claims24
A process for detecting defects in masks comprising:
- generating an aerial image of a portion of a mask;
- generating a simulated image corresponding to original pattern data used to create said mask taking into account expected distortions and corner rounding due to image processing;
- and
- comparing said aerial image to said simulated image.
1 more element
A process for detecting defects in photomasks comprising:
- generating an aerial image of a portion of a photomask;
- generating a simulated image corresponding to original pattern data used to create said photomask taking into account expected distortions and corner rounding due to image processing;
- and
- comparing said aerial image to said simulated image.
1 more element
A process for detecting defects in masks comprising:
- generating an aerial image of a portion of a mask;
- generating a simulated aerial image of a mask design used to generate said portion of said mask;
- and
- comparing said aerial image to said simulated aerial image.
1 more element
Dependencies are inferred from the claim text.