Pattern repair method, pattern repair device, and recording medium

A pattern repair device comprising:

• a memory in which a computer program is stored;
• and
• a hardware processor connected to the memory and configured to perform processing by executing the computer program, the processing including:
• executing a first operation including
• acquiring information about a defect in a pattern of a light shielding film in a photomask, and
• acquiring optical properties of the light shielding film and optical properties of a repair film for repairing the defect;
• executing a second operation including determining a film thickness of the repair film based on the optical properties of the light shielding film and the optical properties of the repair film;
• executing a third operation including acquiring one or more pieces of design information indicating a dimension and a shape of a candidate of a pattern of the repair film, the one or more pieces of design information including film thickness information indicating the film thickness of the repair film;
• executing a fourth operation including calculating an exposure margin for each of the one or more pieces of design information by electromagnetic field calculation using the film thickness information of the repair film;
• executing a fifth operation including selecting a piece of design information corresponding to the exposure margin exceeding a threshold value from among the one or more pieces of design information;
• and
• executing a sixth operation including forming the repair film in the photomask in accordance with the selected piece of design information.

A non-transitory tangible computer-readable storage medium in which a computer program is stored, the computer program instructing a computer to execute processing, the processing comprising:

• executing a first operation including
• acquiring information about a defect in a pattern of a light shielding film in a photomask, and
• acquiring optical properties of the light shielding film and optical properties of a repair film for repairing the defect;
• executing a second operation including determining a film thickness of the repair film based on the optical properties of the light shielding film and the optical properties of the repair film;
• executing a third operation including acquiring one or more pieces of design information indicating a dimension and a shape of a candidate of a pattern of the repair film, the one or more pieces of design information including film thickness information indicating the film thickness of the repair film;
• executing a fourth operation including calculating an exposure margin for each of the one or more pieces of design information by electromagnetic field calculation using the film thickness information of the repair film;
• executing a fifth operation including selecting a piece of design information corresponding to the exposure margin exceeding a threshold value from among the one or more pieces of design information;
• and
• executing a sixth operation including forming the repair film in the photomask in accordance with the selected piece of design information.