G03F 7/70616
Monitoring the printed patterns
Official title: {Monitoring the printed patterns}
G03F7/70616 (Monitoring the printed patterns) appears on 5,001 US grants and 5,213 published applications in this corpus.
Search patents in G03F- Granted patents
- 5,001
- Published applications
- 5,213
- Assignees
- 574
- Inventors
- 7,170
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 4 | 0 |
| 1985 | 6 | 0 |
| 1986 | 5 | 0 |
| 1987 | 7 | 0 |
| 1988 | 15 | 0 |
| 1989 | 10 | 0 |
| 1990 | 11 | 0 |
| 1991 | 16 | 0 |
| 1992 | 14 | 0 |
| 1993 | 12 | 0 |
| 1994 | 25 | 0 |
| 1995 | 17 | 0 |
| 1996 | 21 | 0 |
| 1997 | 39 | 0 |
| 1998 | 67 | 0 |
| 1999 | 77 | 0 |
| 2000 | 64 | 0 |
| 2001 | 69 | 32 |
| 2002 | 100 | 124 |
| 2003 | 119 | 143 |
| 2004 | 126 | 145 |
| 2005 | 144 | 193 |
| 2006 | 126 | 215 |
| 2007 | 143 | 184 |
| 2008 | 142 | 203 |
| 2009 | 174 | 167 |
| 2010 | 168 | 127 |
| 2011 | 135 | 139 |
| 2012 | 112 | 120 |
| 2013 | 103 | 150 |
| 2014 | 146 | 137 |
| 2015 | 162 | 195 |
| 2016 | 154 | 212 |
| 2017 | 188 | 203 |
| 2018 | 221 | 263 |
| 2019 | 316 | 352 |
| 2020 | 344 | 318 |
| 2021 | 294 | 301 |
| 2022 | 248 | 318 |
| 2023 | 238 | 306 |
| 2024 | 230 | 295 |
| 2025 | 238 | 211 |
| 2026 | 145 | 160 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Run to run overlay compensation in lithography sequences employing different lithography methods8 Oct 2026US 2026/0310103 A1
- Repeating noise suppression for array print check inspection8 Oct 2026US 2026/0310104 A1KLA Corporation
- Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure1 Oct 2026US 2026/0298820 A1ASML Netherlands B. V.
- Euv reticle with charge dissipation structure1 Oct 2026US 2026/0299403 A1Intel Corporation
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Method for optical inspection and lithography624US 5,900,354 A1999
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Alumina insulation for coating implantable components and other microminiature devices490US 6,043,437 AAlfred E. Mann Foundation · 2000
- Method of applying insulation for coating implantable components and other microminiature devices464US 6,472,122 B1Medtronic MiniMed, Inc. · 2002