G03F 7/70633
Overlay, i.e. relative alignment between patterns printed by separate exposures in different
Official title: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching}
G03F7/70633 (Overlay, i.e. relative alignment between patterns printed by separate exposures in different) appears on 2,511 US grants and 2,581 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,511
- Published applications
- 2,581
- Assignees
- 322
- Inventors
- 3,522
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 4 | 0 |
| 1988 | 6 | 0 |
| 1989 | 3 | 0 |
| 1990 | 6 | 0 |
| 1991 | 8 | 0 |
| 1992 | 8 | 0 |
| 1993 | 9 | 0 |
| 1994 | 14 | 0 |
| 1995 | 14 | 0 |
| 1996 | 13 | 0 |
| 1997 | 27 | 0 |
| 1998 | 35 | 0 |
| 1999 | 37 | 0 |
| 2000 | 33 | 0 |
| 2001 | 29 | 10 |
| 2002 | 43 | 61 |
| 2003 | 50 | 69 |
| 2004 | 67 | 64 |
| 2005 | 69 | 85 |
| 2006 | 63 | 80 |
| 2007 | 60 | 76 |
| 2008 | 65 | 69 |
| 2009 | 61 | 62 |
| 2010 | 64 | 53 |
| 2011 | 53 | 73 |
| 2012 | 47 | 49 |
| 2013 | 46 | 65 |
| 2014 | 66 | 63 |
| 2015 | 85 | 103 |
| 2016 | 79 | 117 |
| 2017 | 97 | 106 |
| 2018 | 119 | 149 |
| 2019 | 166 | 198 |
| 2020 | 190 | 163 |
| 2021 | 160 | 154 |
| 2022 | 137 | 172 |
| 2023 | 124 | 169 |
| 2024 | 132 | 177 |
| 2025 | 135 | 113 |
| 2026 | 76 | 81 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Mask optimization preferentially accounting for overlap regions6 Oct 2026US 12,754,473 B2D2S, Inc.
- Concurrent mask optimization for multiple layers6 Oct 2026US 12,754,474 B2D2S, Inc.
- Overlay measurement using balanced capacity targets29 Sep 2026US 12,748,354 B2ASML Netherlands B. V.
- Mask optimization accounting for more critical and less critical overlap regions8 Oct 2026US 2026/0310067 A1D2S, Inc.
- Run to run overlay compensation in lithography sequences employing different lithography methods8 Oct 2026US 2026/0310103 A1
- Metrology method and associated metrology and lithographic apparatuses24 Sep 2026US 2026/0288017 A1ASML Netherlands B. V.
- Method and system for creating a stitched design file17 Sep 2026US 2026/0277113 A1APPLIED Materials.Inc.
- Focus Metrology Method Using Overlay Measurement Tool17 Sep 2026US 2026/0277117 A1KLA Corporation
Most cited
By later US patents
- High resolution ellipsometric apparatus348US 5,042,951 ATherma-Wave, Inc. · 1991
- Methods and systems for determining a critical dimension and a thin film characteristic of a specimen248US 6,633,831 B2KLA-Tencor Technologies Corporation · 2003
- Overlay alignment metrology using diffraction gratings230US 6,819,426 B2Therma-Wave, Inc. · 2004
- Overlay alignment measurement of wafers218US 6,023,338 A2000
- Latent-image control of lithography tools176US 5,124,927 AInternational Business Machines Corporation · 1992