G03F 7/70641
Focus
Official title: {Focus}
G03F7/70641 (Focus) appears on 806 US grants and 781 published applications in this corpus.
Search patents in G03F- Granted patents
- 806
- Published applications
- 781
- Assignees
- 161
- Inventors
- 1,430
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 4 | 0 |
| 1989 | 2 | 0 |
| 1990 | 4 | 0 |
| 1991 | 5 | 0 |
| 1992 | 5 | 0 |
| 1993 | 1 | 0 |
| 1994 | 10 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 10 | 0 |
| 1998 | 20 | 0 |
| 1999 | 26 | 0 |
| 2000 | 11 | 0 |
| 2001 | 11 | 1 |
| 2002 | 14 | 17 |
| 2003 | 17 | 28 |
| 2004 | 20 | 22 |
| 2005 | 21 | 33 |
| 2006 | 14 | 39 |
| 2007 | 23 | 28 |
| 2008 | 19 | 30 |
| 2009 | 26 | 30 |
| 2010 | 32 | 26 |
| 2011 | 27 | 20 |
| 2012 | 18 | 18 |
| 2013 | 15 | 24 |
| 2014 | 27 | 33 |
| 2015 | 19 | 30 |
| 2016 | 28 | 38 |
| 2017 | 32 | 38 |
| 2018 | 41 | 39 |
| 2019 | 53 | 66 |
| 2020 | 62 | 53 |
| 2021 | 57 | 38 |
| 2022 | 34 | 36 |
| 2023 | 26 | 31 |
| 2024 | 25 | 32 |
| 2025 | 22 | 15 |
| 2026 | 16 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Integrated optical system for scalable and accurate inspection systems6 Oct 2026US 12,754,485 B2ASML Netherlands B. V.
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Methods of mitigating crosstalk in metrology images18 Aug 2026US 12,710,699 B2ASML Netherlands B. V.
- System, software application, and method for dose uniformity improvement21 Jul 2026US 12,687,788 B2APPLIED Materials.Inc.
- Method of managing semiconductor processing apparatus16 Jun 2026US 12,656,692 B2Samsung Electronics Co., Ltd.
- Overlay Measurement Device, Focus Control Method of Overlay Measurement Device for Tool-induced Shift Measurement, and Focus Control Program of Overlay Measurement Device for Tool-induced Shift Measurement10 Sep 2026US 2026/0267236 A1Auros Technology, Inc.
- Metrology method and associated metrology device20 Aug 2026US 2026/0244115 A1ASML Netherlands B. V.
- Metrology tool for ophthalmic device performance assessment13 Aug 2026US 2026/0235964 A1Alcon Inc.
- Method of focus metrology13 Aug 2026US 2026/0237052 A1ASML Netherlands B. V.
- Illumination source and associated metrology apparatus23 Jul 2026US 2026/0210692 A1ASML Netherlands B. V.
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Alumina insulation for coating implantable components and other microminiature devices490US 6,043,437 AAlfred E. Mann Foundation · 2000
- Method of applying insulation for coating implantable components and other microminiature devices464US 6,472,122 B1Medtronic MiniMed, Inc. · 2002
- Method and apparatus for the production of process sensitive lithographic features255US 6,673,638 B1KLA-Tencor Corporation · 2004