Metrology method and associated metrology device
AssigneeASML Netherlands B.V.
InventorsPatricius Aloysius Jacobus TINNEMANS, Eibert Gerjan VAN PUTTEN
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Abstract
Disclosed is a dark-field metrology method. A first partial electric field is determined from a measurement parameter of first diffracted radiation data relating to a first portion of a diffraction order and a second partial electric field is determined from a measurement parameter of second diffracted radiation data relating to a second portion of the diffraction order, The first portion of the diffraction order and second portion of the diffraction order relate to respective portions of a detection pupil plane or conjugate thereof. An electric field of said diffraction order is determined from said first partial electric field and said second partial electric field.
Claims18
1-15. (canceled)
A dark-field metrology device, comprising:
- an illumination arrangement configured to illuminate a structure on a substrate to generate at least one diffraction order;
- a detection arrangement configured to detect the at least one diffraction order or a portion thereof;
- a spatial filter arrangement in a detection pupil plane or conjugate thereof of the dark-field metrology device, the spatial filter arrangement being operable to separately transmit at least a first portion of the diffraction order and a second portion of the diffraction order such that they are separately detected on the detection arrangement;
- and
- a processor operable to:
- determine a first partial electric field from a measurement parameter of first diffracted radiation data relating to the first portion of the diffraction order;
- determine a second partial electric field from a measurement parameter of second diffracted radiation data relating to the second portion of a diffraction order;
- and
- determine an electric field of the diffraction order from at least the first partial electric field and the second partial electric field.
A dark-field metrology method comprising:
- obtaining at least first diffracted radiation data and second diffracted radiation data, the first diffracted radiation data relating to a first portion of a diffraction order, and the second diffracted radiation data relating to a second portion of the diffraction order, wherein the first portion of the diffraction order and second portion of the diffraction order relate to respective portions of a detection pupil plane or conjugate thereof;
- determining a first partial electric field from a measurement parameter of the first diffracted radiation data;
- determining a second partial electric field from a measurement parameter of the second diffracted radiation data;
- and
- determining an electric field of the diffraction order from the first partial electric field and the second partial electric field.
Dependencies are inferred from the claim text.