G03F 7/70625
Dimensions
Official title: {Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness}
G03F7/70625 (Dimensions) appears on 1,615 US grants and 1,810 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,615
- Published applications
- 1,810
- Assignees
- 260
- Inventors
- 2,992
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 5 | 0 |
| 1995 | 1 | 0 |
| 1996 | 5 | 0 |
| 1997 | 7 | 0 |
| 1998 | 11 | 0 |
| 1999 | 10 | 0 |
| 2000 | 12 | 0 |
| 2001 | 13 | 2 |
| 2002 | 31 | 46 |
| 2003 | 39 | 49 |
| 2004 | 39 | 54 |
| 2005 | 53 | 49 |
| 2006 | 41 | 70 |
| 2007 | 39 | 54 |
| 2008 | 50 | 83 |
| 2009 | 74 | 62 |
| 2010 | 55 | 43 |
| 2011 | 56 | 55 |
| 2012 | 30 | 45 |
| 2013 | 39 | 61 |
| 2014 | 54 | 42 |
| 2015 | 44 | 46 |
| 2016 | 48 | 84 |
| 2017 | 51 | 67 |
| 2018 | 80 | 104 |
| 2019 | 114 | 130 |
| 2020 | 134 | 103 |
| 2021 | 99 | 105 |
| 2022 | 93 | 104 |
| 2023 | 63 | 108 |
| 2024 | 85 | 106 |
| 2025 | 88 | 81 |
| 2026 | 39 | 57 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Modular autoencoder model for manufacturing process parameter estimation29 Sep 2026US 12,748,056 B2ASML Netherlands B. V.
- Critical dimension inspection method and semiconductor device manufacturing method using the same22 Sep 2026US 12,743,026 B2Samsung Electronics Co., Ltd.
- Methods and systems for model-less, scatterometry based measurements of semiconductor structures22 Sep 2026US 12,743,027 B2KLA Corporation
- Method and apparatus for inspection and metrology15 Sep 2026US 12,737,430 B2ASML Netherlands B. V.
- Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure1 Oct 2026US 2026/0298820 A1ASML Netherlands B. V.
- Second-harmonic generation for critical dimensional metrology24 Sep 2026US 2026/0287331 A1FemtoMetrix, Inc.
- Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses24 Sep 2026US 2026/0288016 A1ASML Netherlands B. V.
- Method for configuring a field of view of an inspection apparatus17 Sep 2026US 2026/0277121 A1ASML Netherlands B. V.
- Suppressing specular reflection of mask absorber and on- resolution field stitching3 Sep 2026US 2026/0259486 A1ASML Netherlands B. V.
Most cited
By later US patents
- Critical dimension analysis with simultaneous multiple angle of incidence measurements357US 6,429,943 B1Therma-Wave, Inc. · 2002
- Method and apparatus for measuring the profile of small repeating lines303US 5,963,329 AInternational Business Machines Corporation · 1999
- Method and apparatus for the production of process sensitive lithographic features255US 6,673,638 B1KLA-Tencor Corporation · 2004
- Methods and systems for determining a critical dimension and a thin film characteristic of a specimen248US 6,633,831 B2KLA-Tencor Technologies Corporation · 2003
- Method and system for selective linewidth optimization during a lithographic process204US 6,509,952 B1Silicon Valley Group, Inc. · 2003