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US 2026/0287331 A1Published application
Second-harmonic generation for critical dimensional metrology
AssigneeFemtoMetrix, Inc.
InventorDavid L. Adler
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Abstract
Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device.
Claims19
A system for characterizing a sample using second harmonic generation, the system comprising:
- a sample holder configured to support a sample;
- at least one optical source configured to direct a light beam onto said sample to produce second harmonic generation (SHG) signals;
- an optical detection system comprising at least one optical detector configured to receive the SHG signals emitted from said sample and generate detected SHG signals;
- one or more hardware processors in communication with the optical detection system, the one or more hardware processors configured to:
- receive at least one detected SHG signal;
- and
- determine a geometric feature of the sample or a variation in a geometric feature of the sample based on the at least one detected SHG signal.
4 more elements
Dependencies are inferred from the claim text.