G03F 7/7065
Defects
Official title: {Defects, e.g. optical inspection of patterned layer for defects}
G03F7/7065 (Defects) appears on 657 US grants and 717 published applications in this corpus.
Search patents in G03F- Granted patents
- 657
- Published applications
- 717
- Assignees
- 148
- Inventors
- 1,566
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 5 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 5 | 0 |
| 1999 | 6 | 0 |
| 2000 | 9 | 0 |
| 2001 | 8 | 9 |
| 2002 | 12 | 25 |
| 2003 | 17 | 13 |
| 2004 | 16 | 20 |
| 2005 | 21 | 15 |
| 2006 | 12 | 24 |
| 2007 | 15 | 18 |
| 2008 | 12 | 12 |
| 2009 | 10 | 15 |
| 2010 | 23 | 13 |
| 2011 | 11 | 17 |
| 2012 | 17 | 12 |
| 2013 | 15 | 16 |
| 2014 | 17 | 22 |
| 2015 | 24 | 24 |
| 2016 | 14 | 13 |
| 2017 | 24 | 31 |
| 2018 | 23 | 32 |
| 2019 | 36 | 68 |
| 2020 | 56 | 51 |
| 2021 | 51 | 62 |
| 2022 | 43 | 49 |
| 2023 | 47 | 50 |
| 2024 | 29 | 48 |
| 2025 | 40 | 31 |
| 2026 | 28 | 27 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Field mirrors for imaging field compression driven photon efficiency and imaging wavefront improvement6 Oct 2026US 12,754,482 B2KLA Corporation
- Time-domain optical metrology and inspection of semiconductor devices14 Jul 2026US 12,680,964 B2Nova Ltd.
- Method for characterizing a manufacturing process of semiconductor devices7 Jul 2026US 12,675,051 B2ASML Netherlands B. V.
- Extreme ultraviolet light generation system and electronic device manufacturing method30 Jun 2026US 12,669,756 B2Gigaphoton Inc.
- Repeating noise suppression for array print check inspection8 Oct 2026US 2026/0310104 A1KLA Corporation
- Euv reticle with charge dissipation structure1 Oct 2026US 2026/0299403 A1Intel Corporation
- Computer-implemented method and apparatus for processing a sample with a nanomanipulator17 Sep 2026US 2026/0277119 A1
- Method for efficient dynamic sampling plan generation and accurate probe die loss projection3 Sep 2026US 2026/0259505 A1ASML Netherlands B. V.
- Method for removing defect23 Jul 2026US 2026/0211314 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Methods and systems for determining a critical dimension and a thin film characteristic of a specimen248US 6,633,831 B2KLA-Tencor Technologies Corporation · 2003
- Ultra-broadband UV microscope imaging system with wide range zoom capability168US 5,999,310 A1999
- Inspection method and apparatus for the inspection of either random or repeating patterns151US 5,537,669 AKLA Instruments Corporation · 1996
- Broad spectrum ultraviolet catadioptric imaging system143US 5,717,518 AKLA Instruments Corporation · 1998
- Methods and systems for determining a critical dimension and overlay of a specimen129US 8,179,530 B2KLA-Tencor Technologies Corporation · 2012