Method for characterizing a manufacturing process of semiconductor devices

A non-transitory computer-readable medium comprising instructions therein that, when executed by a processor system, are configured to cause the processor to at least:

• obtain a plurality of distributions of values of a performance parameter, each distribution of the values of the performance parameter is associated with a different processing condition of a device fabrication process configured to create a physical device;
• derive for each distribution of values of the performance parameter an indicator of a probability of the performance parameter being within a specified range to obtain a plurality of probability indicator values, each probability indicator value associated with a different processing condition;
• determine a desired processing condition based on a relation between the value of the probability indicator and the processing condition;
• and
• cause configuration of the device fabrication process based on the desired processing condition and/or provide a signal representing, or based on, the desired processing condition to a system for use in configuration of the device fabrication process.

A method comprising:

• obtaining a relation between i) a value of a probability indicator associated with a probability of a feature on a substrate having a dimension and/or position within a certain range and ii) a processing condition of a device fabrication process configured to create a physical device on the substrate;
• obtaining substrate specific values of one or more parameters associated with the processing condition across at least part of the substrate;
• combining, using a hardware computer, the relation and the substrate specific values to determine a probability of failure of one or more device structures provided to the substrate across at least part of the substrate;
• and
• configuring the device fabrication process based on the desired processing condition and/or providing a signal representing, or based on, the desired processing condition to a system for use in configuration of the device fabrication process.