Imprint apparatus, imprint method and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorTAKAHIRO SATO
Life of this patent
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Abstract
An imprint apparatus including a mold holding unit configured to hold a mold, a deformation unit configured to deform a pattern surface of the mold by adjusting a pressure of a closed space defined between a surface of the mold opposite to the pattern surface and the mold holding unit in a state in which the mold is held by the mold holding unit, and a control unit configured to control a shape of the pattern surface by adjusting the pressure of the closed space by the deformation unit in accordance with a position of a shot region to make the shape of the pattern surface conform to a surface shape of the shot region when forming the pattern in each of a plurality of shot regions.
Claims12
An imprint method of forming a pattern of an imprint material in each of a plurality of shot regions of a substrate using a mold, the method comprising:
- holding the substrate on a holding surface of a substrate holding unit;
- and
- deforming a pattern surface of the mold by adjusting a pressure of a closed space defined between a surface of the mold opposite to the pattern surface and a mold holding unit in a state in which the mold is held by the mold holding unit,
- wherein in the deforming, a shape of the pattern surface is controlled by adjusting the pressure of the closed space during a contacting step and a filling step of an imprint process in accordance with a position of the shot region to make the shape of the pattern surface conform to a surface shape of the shot region when forming the pattern in each of the plurality of shot regions,
- wherein, during the contacting step, a positive pressure, greater than an atmospheric pressure around the closed space, is applied to the closed space to deform the shape of the pattern surface into a convex shape, and
- wherein, during the filling step, for a shot region including a non-facing region that is positioned at a periphery of the substrate and does not face the holding surface in a state in which the substrate is held by the substrate holding unit, a negative pressure, less than the atmospheric pressure around the closed space, is applied to the closed space to deform the shape of the pattern surface into a concave shape to make the shape of the pattern surface conform to a curve generated in the non-facing region.
Dependencies are inferred from the claim text.