High-performance adaptable sampling system
AssigneeTokyo Electron Limited
InventorsCharles Schlechte, Jianping Zhao, Michael Hummel
Life of this patent
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AssigneeTokyo Electron Limited
InventorsCharles Schlechte, Jianping Zhao, Michael Hummel
Estimating the term…
According to an embodiment, a plasma processing system is proposed. The plasma processing system includes a processing chamber for plasma; a two-chambered pumping block linked to the chamber through an orifice that creates a particle beam via a pressure difference, with the upper pressure regulated by a connected vacuum pump; a detector stage attached to the pumping block through another orifice and connectable to a vacuum pump to guide the beam through a third orifice; a mass spectrometer connected to the detector stage via the third orifice, featuring an ionizer that ionizes the beam's species by cycling through energy levels in multiple steps; and a shutter installed in the pumping block's path of the particle beam, designed to operate at each energy level step.
A method of measuring quantities of species in a processing chamber, the method comprising:
A sampling system for measuring quantities of species in a processing chamber, the sampling system comprising:
A plasma processing system, comprising:
Dependencies are inferred from the claim text.