H01J 2237/30
Electron or ion beam tubes for processing objects
H01J2237/30 (Electron or ion beam tubes for processing objects) appears on 5,128 US grants and 4,758 published applications in this corpus.
Search patents in H01J- Granted patents
- 5,128
- Published applications
- 4,758
- Assignees
- 958
- Inventors
- 6,854
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 1 | 0 |
| 1981 | 6 | 0 |
| 1982 | 7 | 0 |
| 1983 | 1 | 0 |
| 1984 | 9 | 0 |
| 1985 | 13 | 0 |
| 1986 | 11 | 0 |
| 1987 | 17 | 0 |
| 1988 | 10 | 0 |
| 1989 | 16 | 0 |
| 1990 | 13 | 0 |
| 1991 | 19 | 0 |
| 1992 | 54 | 0 |
| 1993 | 47 | 0 |
| 1994 | 52 | 0 |
| 1995 | 59 | 0 |
| 1996 | 66 | 0 |
| 1997 | 62 | 0 |
| 1998 | 109 | 0 |
| 1999 | 132 | 0 |
| 2000 | 130 | 0 |
| 2001 | 151 | 53 |
| 2002 | 141 | 189 |
| 2003 | 188 | 170 |
| 2004 | 177 | 214 |
| 2005 | 161 | 217 |
| 2006 | 186 | 245 |
| 2007 | 133 | 218 |
| 2008 | 189 | 235 |
| 2009 | 181 | 188 |
| 2010 | 189 | 157 |
| 2011 | 134 | 153 |
| 2012 | 167 | 199 |
| 2013 | 159 | 208 |
| 2014 | 215 | 209 |
| 2015 | 194 | 270 |
| 2016 | 220 | 212 |
| 2017 | 232 | 199 |
| 2018 | 167 | 151 |
| 2019 | 193 | 182 |
| 2020 | 190 | 194 |
| 2021 | 140 | 146 |
| 2022 | 127 | 149 |
| 2023 | 129 | 173 |
| 2024 | 121 | 164 |
| 2025 | 122 | 142 |
| 2026 | 80 | 121 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- End point determination by means of contrast gas29 Sep 2026US 12,748,347 B2Carl Zeiss SMT GmbH
- Method and system for analyzing three-dimensional features22 Sep 2026US 12,744,180 B2FEI Company
- Focused ion beam device8 Sep 2026US 12,731,755 B2Hitachi High-Tech Science Corporation
- Support structure of inverted lamella for tall ROI1 Sep 2026US 12,725,757 B2FEI Company
- Method of sample preparation and analysis25 Aug 2026US 12,719,012 B2FEI Company
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion implanter and ion implantation method8 Oct 2026US 2026/0311963 A1Chongqing Advanced Silicon Technology Co., LTD
- Method for fabricating superconducting qubits by focused ion beam annealing8 Oct 2026US 2026/0314268 A1Bmstu
- Ion implanter and ion implantation method24 Sep 2026US 2026/0290748 A1Sumitomo Heavy Industries Material Solutions Co., Ltd.
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Position measurement apparatus and method and pattern forming apparatus and writing method551US 7,640,142 B2NuFlare Technology, Inc. · 2009
- Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same425US 7,799,706 B2Sungkyunkwan University Foundation for Corporate Collaboration · 2010
- Optical proximity correction method and apparatus293US 6,269,472 B1LSI Logic Corporation · 2001
- Method and apparatus for in situ anneal during ion implant283US 6,111,260 AAdvanced Micro Devices, Inc. · 2000