H01J 2237/303
Electron or ion optical systems
H01J2237/303 (Electron or ion optical systems) appears on 73 US grants and 79 published applications in this corpus.
Search patents in H01J- Granted patents
- 73
- Published applications
- 79
- Assignees
- 48
- Inventors
- 165
- Latest grant
- 28 Jan 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 2 | 0 |
| 2006 | 1 | 1 |
| 2007 | 1 | 0 |
| 2008 | 1 | 2 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 1 | 1 |
| 2012 | 1 | 3 |
| 2013 | 0 | 2 |
| 2014 | 4 | 5 |
| 2015 | 9 | 19 |
| 2016 | 9 | 7 |
| 2017 | 11 | 13 |
| 2018 | 7 | 4 |
| 2019 | 6 | 5 |
| 2020 | 6 | 4 |
| 2021 | 1 | 2 |
| 2022 | 2 | 2 |
| 2023 | 3 | 0 |
| 2024 | 2 | 2 |
| 2025 | 1 | 2 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charge carrier generation source28 Jan 2025US 12,211,663 B2Scia Systems GmbH
- Systems and methods for electron beam focusing in electron beam additive manufacturing19 Nov 2024US 12,148,592 B2General Electric Company
- Apparatus and techniques for substrate processing using independent ion source and radical source28 May 2024US 11,996,266 B2APPLIED Materials.Inc.
- Systems and methods for electron beam focusing in electron beam additive manufacturing5 Dec 2023US 11,837,428 B2General Electric Company
- Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces7 Nov 2023US 11,810,755 B2APPLIED Materials.Inc.
- Ion implanter and ion implantation method8 Oct 2026US 2026/0311963 A1Chongqing Advanced Silicon Technology Co., LTD
- Apparatus and techniques for substrate processing using independent ion source and radical source13 Aug 2026US 2026/0237601 A1APPLIED Materials.Inc.
- Output window unit12 Feb 2026US 2026/0045446 A1Hamamatsu Photonics K.K.
- System and method for managing solid phase precursors for an ion implantation system7 Aug 2025US 2025/0253125 A1Axcelis Technologies, Inc.
- Ion beam reflector, substrate processing apparatus including the same, and substrate processing method using the same17 Jul 2025US 2025/0232948 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Ion and charged particle source for production of thin films62US 6,878,930 B12005
- Masked ion beam lithography system and method34US 4,757,208 AHughes Aircraft Company · 1988
- Energy filtered focused ion beam column29US 6,410,924 B1Schlumberger Technologies, Inc. · 2002
- Biased electrostatic deflector21US 7,022,984 B1Axcelis Technologies, Inc. · 2006
- Electro-magnetic lens, charged particle beam transferring apparatus, and method for manufacturing electro-magnetic lens12US 5,629,526 ANikon Corporation · 1997