Ion and charged particle source for production of thin films

An ion or charged particle transmission device for delivery of charged material to a deposition or reaction surface at reduced pressures, said device comprising;

• a) a near atmospheric pressure ion or charged particle source,
• b) a high transmission electrode surface at or near atmospheric pressure that controls the efficiency of passage and spatial distribution of said charged material through said surface into a beam creation optics region,
• c) beam creation optics in said beam creation optics region at or near atmospheric pressure to generate a collimated beam of said charged material,
• d) a conductance aperture or tube, or an array of apertures and tubes, to enable transmission of said charged material from said ion source into a lower pressure deposition region,
• e) one or more stages of pressure reduction with ion optics, ion guides, or a combination thereof to transfer said charge material into said lower pressure region;
• f) ion beam control optics in said lower pressure region downstream of said pressure reduction,
• g) a positionally static or movable material collection surface in said lower pressure regions downstream of said low pressure ion beam control optics said collection surface at a lower electrical potential than said low pressure optics to enable attraction and deposition of said charged material to said collection surface;
• whereby, the delivery of said charged material from said source is precisely controlled in terms of spatial distribution, temporal disposition, composition, and energy.

An ion or charged particle transmission device at or near atmospheric pressure for delivery of charged material to a deposition or reaction surface, said device comprising;

• a) a near atmospheric pressure ion or charged particle source,
• b) a high transmission electrode surface at that controls the passage efficiency and spatial distribution of said charged material through said surface and into a funnel-well region,
• c) funnel-well optics with associated power supplies in funnel-well region to generate a collimated ion beam of said charged material,
• d) a positionally static or movable material collection surface held at a lower electrical potential than said ion source enabling attraction and deposition of said charged material onto said collection surface;
• whereby, the delivery of said charged material from said source has precisely controlled spatial distribution, temporal deposition, composition, and energy.

A method of delivering charged material, such as ions or charged particles to a deposition or reaction surface at or near atmospheric pressure, said method comprising;

• a) generating ions or charged particles in a charged material source;
• b) transmitting said charged material through a high transmission surface in order to control composition, spatial distribution, and temporal transmission profile into focusing region;
• c) providing a means of focusing transmitted said charged material once said material pass through said high transmission surface;
• d) providing a means of collimating focused charged material into precisely defined beams,
• e) depositing and reacting said charged material on a positionally static or movable deposition surface;
• whereby, the delivery of said charged material from said source has precisely controlled spatial distribution, temporal deposition, composition, and energy.

A method of producing a structure by delivering charged material, such as ions or charged particles to a deposition or reaction surface, said method comprising;

• a) generating ions or charged particles in a charged material source at or near atmospheric pressure;
• b) transmitting said charged material through a high transmission surface at or near atmospheric pressure in order to control composition, spatial distribution, and temporal transmission profile into focusing region;
• c) providing a means at or near atmospheric pressure of focusing transmitted said charged material once said material pass through said high transmission surface;
• d) providing a means at or near atmospheric pressure of collimating focused charged material into precisely defined beams,
• e) depositing and reacting said charged material on a deposition surface;
• whereby, the delivery of said charged material from said source has precisely controlled spatial distribution, temporal deposition, composition, and energy resulting in the deposition of said material and the production of said structure.