H01J 2237/245
Detection characterised by the variable being measured
H01J2237/245 (Detection characterised by the variable being measured) appears on 1,844 US grants and 2,258 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,844
- Published applications
- 2,258
- Assignees
- 433
- Inventors
- 4,121
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 3 | 0 |
| 1978 | 6 | 0 |
| 1979 | 4 | 0 |
| 1980 | 3 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 1 | 0 |
| 1986 | 4 | 0 |
| 1987 | 7 | 0 |
| 1988 | 8 | 0 |
| 1989 | 11 | 0 |
| 1990 | 7 | 0 |
| 1991 | 9 | 0 |
| 1992 | 9 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 9 | 0 |
| 1996 | 3 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 4 | 3 |
| 2002 | 3 | 20 |
| 2003 | 17 | 12 |
| 2004 | 16 | 28 |
| 2005 | 21 | 32 |
| 2006 | 29 | 54 |
| 2007 | 42 | 60 |
| 2008 | 69 | 95 |
| 2009 | 48 | 70 |
| 2010 | 69 | 52 |
| 2011 | 58 | 54 |
| 2012 | 53 | 64 |
| 2013 | 66 | 76 |
| 2014 | 84 | 61 |
| 2015 | 66 | 88 |
| 2016 | 69 | 70 |
| 2017 | 79 | 68 |
| 2018 | 64 | 72 |
| 2019 | 78 | 123 |
| 2020 | 117 | 162 |
| 2021 | 93 | 126 |
| 2022 | 104 | 133 |
| 2023 | 102 | 197 |
| 2024 | 107 | 209 |
| 2025 | 152 | 187 |
| 2026 | 121 | 142 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 2237/24571Measurements of non-electric or non-magnetic variablesIndexing code661
- H01J 2237/24507Intensity, dose or other characteristics of particle beams or electromagnetic radiationIndexing code639
- H01J 2237/24592Inspection and quality control of devicesIndexing code426
- H01J 2237/24564Measurements of electric or magnetic variablesIndexing code412
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- E-beam exposure method and mask manufacturing method comprising the same6 Oct 2026US 12,755,931 B2Samsung Electronics Co., Ltd.
- Arc current reduction from an electrostatic chuck6 Oct 2026US 12,757,680 B2APPLIED Materials.Inc.
- Physical vapor deposition system and methods of operating the same29 Sep 2026US 12,747,492 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Shielded apparatus for ion energy analysis of plasma processes29 Sep 2026US 12,749,649 B2APPLIED Materials.Inc.
- Systems and methods for subvoxel sem based volume electron microscopy8 Oct 2026US 2026/0311959 A1Yale University
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Precise and accurate critical dimension measurement by modeling local charging distortion8 Oct 2026US 2026/0311962 A1ASML Netherlands B. V.
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- System and Method for Extending Faraday Setup Cup Life Time by Scanning Ion Beam during Setup1 Oct 2026US 2026/0302125 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Method of detecting defects in patterned substrates227US 6,252,412 B1Schlumberger Technologies, Inc. · 2001
- Metrology and 3D reconstruction of devices in a wafer153US 8,097,846 B1Western Digital (Fremont), LLC · 2012
- Method for inspecting substrate, substrate inspecting system and electron beam apparatus113US 7,109,483 B2Ebara Corporation · 2006
- Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations113US 8,716,662 B1KLA-Tencor Corporation · 2014
- Apparatus and methods for electron beam detection111US 8,692,204 B2KLA-Tencor Corporation · 2014