H01J 2237/24592
Inspection and quality control of devices
H01J2237/24592 (Inspection and quality control of devices) appears on 426 US grants and 486 published applications in this corpus.
Search patents in H01J- Granted patents
- 426
- Published applications
- 486
- Assignees
- 111
- Inventors
- 981
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 2 |
| 2002 | 2 | 7 |
| 2003 | 4 | 4 |
| 2004 | 7 | 11 |
| 2005 | 8 | 14 |
| 2006 | 13 | 24 |
| 2007 | 15 | 17 |
| 2008 | 20 | 20 |
| 2009 | 15 | 18 |
| 2010 | 14 | 14 |
| 2011 | 18 | 17 |
| 2012 | 15 | 13 |
| 2013 | 14 | 18 |
| 2014 | 15 | 7 |
| 2015 | 18 | 29 |
| 2016 | 19 | 18 |
| 2017 | 37 | 22 |
| 2018 | 17 | 16 |
| 2019 | 22 | 29 |
| 2020 | 28 | 33 |
| 2021 | 15 | 22 |
| 2022 | 19 | 28 |
| 2023 | 21 | 23 |
| 2024 | 18 | 34 |
| 2025 | 21 | 28 |
| 2026 | 15 | 18 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- System and method for inspection by deflector control in a charged particle system22 Sep 2026US 12,744,178 B2ASML Netherlands B. V.
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Plasma processing system, assistance device, assistance method, and assistance program8 Sep 2026US 12,731,763 B2Tokyo Electron Limited
- Charged-particle optical device18 Aug 2026US 12,712,147 B2ASML Netherlands B. V.
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Precise and accurate critical dimension measurement by modeling local charging distortion8 Oct 2026US 2026/0311962 A1ASML Netherlands B. V.
- High-performance adaptable sampling system1 Oct 2026US 2026/0302145 A1Tokyo Electron Limited
- Charged-Particle Beam Device13 Aug 2026US 2026/0237593 A1Hitachi High-Tech Corporation
- Quantifying film accumulation on an insulating surface in semiconductor processing equipment6 Aug 2026US 2026/0229451 A1
Most cited
By later US patents
- Method of detecting defects in patterned substrates227US 6,252,412 B1Schlumberger Technologies, Inc. · 2001
- Metrology and 3D reconstruction of devices in a wafer153US 8,097,846 B1Western Digital (Fremont), LLC · 2012
- Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations113US 8,716,662 B1KLA-Tencor Corporation · 2014
- Multi-pixel electron emission die-to-die inspection87US 6,897,444 B1KLA-Tencor Technologies Corporation · 2005
- Pattern inspection apparatus and electron beam apparatus86US 5,430,292 AFujitsu Limited · 1995