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US 2026/0229451 A1Published application
Quantifying film accumulation on an insulating surface in semiconductor processing equipment
OwnerRajen Sud, Yusef Nouriinventors
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Abstract
Ions are generated using an ion source and directed toward a workpiece on a chuck. Resistance and/or reactance between at least two pick-up measurement wires and a stimulating electrode in a sensor is measured. The sensor is on a surface of a chamber that the ions are within. The surface is fabricated of a material that is an insulator. A thickness of a film accumulation on the surface is determined using the resistance and/or the reactance between the at least two pick-up measurement wires and the stimulating electrode
Claims20
A system comprising:
- an ion source configured to generate ions;
- a chuck configured to hold a workpiece;
- a chamber that the ions are within;
- a sensor with at least two pick-up measurement wires and a stimulating electrode disposed on a surface of the chamber, wherein the sensor measures resistance and/or reactance between the at least two pick-up measurement wires and the stimulating electrode, and wherein the surface is fabricated of a material that is an insulator;
- a power source in electronic communication with the stimulating electrode;
- and
- a processor in electronic communication with the sensor, wherein the processor is configured to determine a film accumulation on the surface using the resistance and/or the reactance between the at least two pick-up measurement wires and the stimulating electrode.
4 more elements
A method comprising:
- generating ions using an ion source;
- directing the ions toward a workpiece on a chuck;
- measuring resistance and/or reactance between at least two pick-up measurement wires and a stimulating electrode in a sensor, wherein the sensor is disposed on a surface of a chamber that the ions are within, and wherein the surface is fabricated of a material that is an insulator;
- and
- determining, using a processor, a thickness of a film accumulation on the surface using the resistance and/or the reactance between the at least two pick-up measurement wires and the stimulating electrode.
2 more elements
Dependencies are inferred from the claim text.