H01J 2237/24571
Measurements of non-electric or non-magnetic variables
H01J2237/24571 (Measurements of non-electric or non-magnetic variables) appears on 661 US grants and 879 published applications in this corpus.
Search patents in H01J- Granted patents
- 661
- Published applications
- 879
- Assignees
- 212
- Inventors
- 2,039
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 3 | 0 |
| 1989 | 5 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 5 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 0 |
| 2002 | 0 | 3 |
| 2003 | 2 | 0 |
| 2004 | 5 | 8 |
| 2005 | 3 | 12 |
| 2006 | 6 | 12 |
| 2007 | 8 | 19 |
| 2008 | 21 | 24 |
| 2009 | 14 | 19 |
| 2010 | 17 | 9 |
| 2011 | 16 | 23 |
| 2012 | 12 | 23 |
| 2013 | 20 | 29 |
| 2014 | 32 | 26 |
| 2015 | 24 | 27 |
| 2016 | 27 | 29 |
| 2017 | 23 | 25 |
| 2018 | 27 | 24 |
| 2019 | 24 | 48 |
| 2020 | 44 | 65 |
| 2021 | 34 | 50 |
| 2022 | 38 | 67 |
| 2023 | 44 | 91 |
| 2024 | 42 | 95 |
| 2025 | 73 | 98 |
| 2026 | 61 | 53 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Arc current reduction from an electrostatic chuck6 Oct 2026US 12,757,680 B2APPLIED Materials.Inc.
- Physical vapor deposition system and methods of operating the same29 Sep 2026US 12,747,492 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Shielded apparatus for ion energy analysis of plasma processes29 Sep 2026US 12,749,649 B2APPLIED Materials.Inc.
- High precision edge ring centering for substrate processing systems22 Sep 2026US 12,744,191 B2Lam Research Corporation
- Improved plasma products and methods for producing same by using multiple simultaneous electrical discharges24 Sep 2026US 2026/0290760 A1Plazer IP, LLC
- Plasma measurement method and plasma measurement system17 Sep 2026US 2026/0279747 A1Tokyo Electron Limited
- Substrate processing system, substrate processing method, and non-transitory computer-readable storage medium17 Sep 2026US 2026/0282825 A1Tokyo Electron Limited
- Modular metrology apparatus for interchangeable process modules10 Sep 2026US 2026/0269171 A1
- Analysis System10 Sep 2026US 2026/0269177 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Metrology and 3D reconstruction of devices in a wafer153US 8,097,846 B1Western Digital (Fremont), LLC · 2012
- Process for controlling the strike positions of a plurality of electron beams on a melting bath77US 4,988,844 ALeybold Aktiengesellschaft · 1991
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Scanning electron microscope66US 6,847,038 B2Hitachi, Ltd. · 2005
- Structure for inspecting defects in word line array fabricated by SADP process and method thereof61US 8,748,814 B1Hermes Microvision, Inc. · 2014