Structure for inspecting defects in word line array fabricated by SADP process and method thereof

An inspection tool, comprising:

• a charged particle source for generating a charged particle beam;
• a detection system for detecting charged particles emanated;
• and
• a substrate with a test structure thereon including an contour circuit covering one end of a conductive line array and alternatively floating and grounding the conductive line array, thereby a short defect between any two conductive line of the conductive line array or an open defect of one conductive line of the conductive line array can be identified in an inspection process through the impingement of the charged particle beam on the substrate and the detection of charged particles emanated from the test structure.

A method for detecting a conductive line array of a device, comprising:

• providing a conductive layer on a substrate;
• forming a patterned photoresist layer on the substrate;
• depositing a conformal film on the patterned photoresist layer and the conductive layer;
• blanket etching the conformal film to form spacers on sidewalls of the patterns photoresist, wherein the spacers include a conductive line array pattern and a contour circuit pattern covering one end of the conductive line array;
• removing the patterned photoresist layer;
• etching the conductive layer by using the spacers as a mask to form the conductive line array and a contour circuit covering the end of the conductive line array;
• removing the spacers;
• and
• removing a plurality of portions of the contour circuit such that the conductive line array is alternatively floated and grounded, thereby a short defect between any two conductive line of the conductive line array or an open defect of any one conductive line of the conductive line array can be identified in an inspection process.