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US 12,749,649 B2Granted
Shielded apparatus for ion energy analysis of plasma processes
AssigneeApplied Materials, Inc.
InventorsDavid Gahan, Paul Scullin
Life of this patent
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Abstract
An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising a substrate, a plurality of ion energy sensors each having associated control circuitry disposed in the substrate, and a conductive enclosure disposed in the substrate and surrounding each ion energy sensor and associated control circuitry such that the substrate at least partially surrounds the conductive enclosure.
Claims13
An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising:
- a substrate;
- a plurality of ion energy sensors each having associated control circuitry disposed in the substrate;
- and
- a conductive enclosure disposed in the substrate and surrounding each ion energy sensor and associated control circuitry such that the substrate at least partially surrounds the conductive enclosure, wherein each ion energy sensor and associated control circuitry are disposed within the conductive enclosure.
1 more element
Dependencies are inferred from the claim text.