H01J 2237/24585
Other variables
Official title: Other variables, e.g. energy, mass, velocity, time, temperature
H01J2237/24585 (Other variables) appears on 313 US grants and 444 published applications in this corpus.
Search patents in H01J- Granted patents
- 313
- Published applications
- 444
- Assignees
- 145
- Inventors
- 1,097
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 1 | 3 |
| 2005 | 1 | 6 |
| 2006 | 5 | 3 |
| 2007 | 3 | 5 |
| 2008 | 6 | 4 |
| 2009 | 2 | 6 |
| 2010 | 3 | 3 |
| 2011 | 5 | 10 |
| 2012 | 4 | 5 |
| 2013 | 8 | 6 |
| 2014 | 12 | 11 |
| 2015 | 7 | 14 |
| 2016 | 11 | 10 |
| 2017 | 12 | 12 |
| 2018 | 13 | 15 |
| 2019 | 14 | 24 |
| 2020 | 19 | 31 |
| 2021 | 17 | 33 |
| 2022 | 16 | 39 |
| 2023 | 23 | 47 |
| 2024 | 30 | 60 |
| 2025 | 40 | 65 |
| 2026 | 33 | 31 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Arc current reduction from an electrostatic chuck6 Oct 2026US 12,757,680 B2APPLIED Materials.Inc.
- Physical vapor deposition system and methods of operating the same29 Sep 2026US 12,747,492 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Shielded apparatus for ion energy analysis of plasma processes29 Sep 2026US 12,749,649 B2APPLIED Materials.Inc.
- Vacuum sealing integrity of cryogenic electrostatic chucks using non-contact surface temperature measuring probes15 Sep 2026US 12,736,415 B2APPLIED Materials.Inc.
- Improved plasma products and methods for producing same by using multiple simultaneous electrical discharges24 Sep 2026US 2026/0290760 A1Plazer IP, LLC
- Plasma measurement method and plasma measurement system17 Sep 2026US 2026/0279747 A1Tokyo Electron Limited
- Endpoint detection using spectral or temporal pattern matching3 Sep 2026US 2026/0260858 A1Lam Research Corporation
- Methods of manufacturing plasma generating cells for a plasma source16 Jul 2026US 2026/0202227 A1APPLIED Materials.Inc.
- Plasma processing apparatus16 Jul 2026US 2026/0204516 A1Tokyo Electron Limited
Most cited
By later US patents
- Scanning electron microscope66US 6,847,038 B2Hitachi, Ltd. · 2005
- Real time monitoring with closed loop chucking force control47US 10,460,916 B2APPLIED Materials.Inc. · 2019
- Automated adjustment of an energy filtering transmission electron microscope41US 5,798,524 AGatan, Inc. · 1998
- Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices40US 5,493,116 AMetrologix, Inc. · 1996
- Particle beam system and method for the particle-optical examination of an object36US 10,535,494 B2Carl Zeiss Microscopy GmbH · 2020