Particle beam system and method for the particle-optical examination of an object
AssigneeCarl Zeiss Microscopy GmbH
InventorsDirk Zeidler, Stefan Schubert
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AssigneeCarl Zeiss Microscopy GmbH
InventorsDirk Zeidler, Stefan Schubert
Estimating the term…
A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.
A particle beam system, comprising:
A method, comprising:
Dependencies are inferred from the claim text.