Arc current reduction from an electrostatic chuck

A method of reducing current arcs in semiconductor processing chambers, the method comprising:

• causing a semiconductor process to be performed on a substrate supported by a pedestal in a semiconductor processing chamber, wherein the pedestal comprises one or more electrodes of an electrostatic chuck (ESC) embedded in the pedestal;
• determining a current of an ESC power source at which arcing does not occur from the one or more electrodes during the semiconductor process;
• setting an adjustable current limit of a current limiting circuit integrated into the ESC power source based on the current at which arcing does not occur;
• and
• causing the ESC power source to provide a chucking voltage to the one or more electrodes during the semiconductor process, wherein the current limiting circuit prevents a current output of the ESC power source from exceeding the adjustable current limit.