H01J 2237/24507
Intensity, dose or other characteristics of particle beams or electromagnetic radiation
H01J2237/24507 (Intensity, dose or other characteristics of particle beams or electromagnetic radiation) appears on 639 US grants and 679 published applications in this corpus.
Search patents in H01J- Granted patents
- 639
- Published applications
- 679
- Assignees
- 217
- Inventors
- 1,331
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 3 | 0 |
| 1978 | 4 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 3 | 0 |
| 1985 | 0 | 0 |
| 1986 | 4 | 0 |
| 1987 | 6 | 0 |
| 1988 | 5 | 0 |
| 1989 | 10 | 0 |
| 1990 | 5 | 0 |
| 1991 | 7 | 0 |
| 1992 | 5 | 0 |
| 1993 | 4 | 0 |
| 1994 | 3 | 0 |
| 1995 | 5 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 2 |
| 2003 | 6 | 5 |
| 2004 | 6 | 11 |
| 2005 | 8 | 7 |
| 2006 | 6 | 21 |
| 2007 | 15 | 23 |
| 2008 | 29 | 49 |
| 2009 | 21 | 31 |
| 2010 | 38 | 28 |
| 2011 | 22 | 19 |
| 2012 | 23 | 26 |
| 2013 | 33 | 34 |
| 2014 | 34 | 21 |
| 2015 | 30 | 35 |
| 2016 | 23 | 24 |
| 2017 | 24 | 18 |
| 2018 | 16 | 26 |
| 2019 | 32 | 41 |
| 2020 | 41 | 46 |
| 2021 | 29 | 23 |
| 2022 | 24 | 27 |
| 2023 | 26 | 39 |
| 2024 | 25 | 48 |
| 2025 | 31 | 33 |
| 2026 | 16 | 42 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Chamber impedance management in a processing chamber22 Sep 2026US 12,744,185 B2APPLIED Materials.Inc.
- Endpoint detection in low open area and/or high aspect ratio etch applications22 Sep 2026US 12,745,608 B2APPLIED Materials.Inc.
- Spin-polarized scanning electron microscope8 Sep 2026US 12,731,760 B2Hitachi High-Tech Corporation
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Self-referencing health monitoring system for multi-beam SEM tools28 Jul 2026US 12,695,053 B2ASML Netherlands B. V.
- Systems and methods for subvoxel sem based volume electron microscopy8 Oct 2026US 2026/0311959 A1Yale University
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Method, apparatus and system for characterizing energetic neutral component of a particle beam24 Sep 2026US 2026/0290741 A1Axcelis Technologies, Inc.
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Ion implanter and ion implantation method24 Sep 2026US 2026/0290748 A1Sumitomo Heavy Industries Material Solutions Co., Ltd.
Most cited
By later US patents
- Apparatus and methods for electron beam detection111US 8,692,204 B2KLA-Tencor Corporation · 2014
- High-speed electron beam inspection58US 7,315,022 B1KLA-Tencor Technologies Corporation · 2008
- Electron detector for use in a gaseous environment53US 4,897,545 AElectroScan Corporation · 1990
- Charged particle beam exposure apparatus48US 7,692,166 B2Canon Kabushiki Kaisha · 2010
- Dose measurement and uniformity monitoring system for ion implantation43US 4,751,393 AVarian Associates, Inc. · 1988