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AssigneeKLA-Tencor Corporation
InventorsShinichi Kojima, Christopher F. Bevis, Joseph Maurino, William M. Tong
Estimating the term…
One embodiment disclosed relates a method of detecting a patterned electron beam. The patterned electron beam is focused onto a grating with a pattern that has a same pitch as the patterned electron beam. Electrons of the patterned electron beam that pass through the grating un-scattered are detected. Another embodiment relates to focusing the patterned electron beam onto a grating with a pattern that has a second pitch that is different than a first pitch of the patterned electron beam. Electrons of the patterned electron beam that pass through the grating form a Moiré pattern that is detected using a position-sensitive detector. Other embodiments, aspects and features are also disclosed.
An apparatus for detecting a patterned electron beam, the apparatus comprising:
A method of detecting a patterned electron beam, the method comprising:
An apparatus for detecting a patterned electron beam, the apparatus comprising:
A method of detecting a patterned electron beam, the method comprising:
Dependencies are inferred from the claim text.