H01J 2237/24514
Beam diagnostics including control of the parameter or property diagnosed
Official title: Beam diagnostics including control of the parameter or property diagnosed (H01J2237/30472 takes precedence)
H01J2237/24514 (Beam diagnostics including control of the parameter or property diagnosed) appears on 399 US grants and 477 published applications in this corpus.
Search patents in H01J- Granted patents
- 399
- Published applications
- 477
- Assignees
- 120
- Inventors
- 791
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 4 | 2 |
| 2004 | 5 | 8 |
| 2005 | 5 | 5 |
| 2006 | 4 | 12 |
| 2007 | 10 | 17 |
| 2008 | 24 | 38 |
| 2009 | 15 | 26 |
| 2010 | 31 | 23 |
| 2011 | 15 | 12 |
| 2012 | 20 | 21 |
| 2013 | 23 | 27 |
| 2014 | 28 | 15 |
| 2015 | 22 | 27 |
| 2016 | 21 | 22 |
| 2017 | 19 | 10 |
| 2018 | 11 | 19 |
| 2019 | 22 | 25 |
| 2020 | 28 | 27 |
| 2021 | 16 | 16 |
| 2022 | 17 | 18 |
| 2023 | 19 | 28 |
| 2024 | 11 | 24 |
| 2025 | 17 | 25 |
| 2026 | 8 | 30 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Self-referencing health monitoring system for multi-beam SEM tools28 Jul 2026US 12,695,053 B2ASML Netherlands B. V.
- In-situ ion beam angle measurement21 Apr 2026US 12,609,279 B2APPLIED Materials.Inc.
- FIB and SEM resolution enhancement using asymmetric probe deconvolution7 Apr 2026US 12,597,583 B2FEI Company
- Electron microscope and specimen orientation alignment method24 Mar 2026US 12,586,752 B2JEOL Ltd.
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Method, apparatus and system for characterizing energetic neutral component of a particle beam24 Sep 2026US 2026/0290741 A1Axcelis Technologies, Inc.
- Ion implanter and ion implantation method24 Sep 2026US 2026/0290748 A1Sumitomo Heavy Industries Material Solutions Co., Ltd.
- Plasma measurement method and plasma measurement system17 Sep 2026US 2026/0279747 A1Tokyo Electron Limited
- Faraday apparatus and ion implanter including faraday apparatus10 Sep 2026US 2026/0269179 A1Nissin Ion Equipment Co., Ltd.
Most cited
By later US patents
- Apparatus and methods for electron beam detection111US 8,692,204 B2KLA-Tencor Corporation · 2014
- Charged particle beam drawing apparatus and article manufacturing method using same33US 8,384,051 B2Canon Kabushiki Kaisha · 2013
- Charged particle beam detection system32US 6,847,036 B1University of Washington · 2005
- Method and apparatus for determining beam parallelism and direction28US 6,791,094 B1Varian Semiconductor Equipment Associates, Inc. · 2004
- Technique and apparatus for monitoring ion mass, energy, and angle in processing systems26US 8,698,107 B2Varian Semiconductor Equipment Associates, Inc. · 2014