H01J 2237/24535
Beam current
H01J2237/24535 (Beam current) appears on 113 US grants and 140 published applications in this corpus.
Search patents in H01J- Granted patents
- 113
- Published applications
- 140
- Assignees
- 53
- Inventors
- 308
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 2 |
| 2007 | 3 | 4 |
| 2008 | 3 | 14 |
| 2009 | 5 | 6 |
| 2010 | 11 | 9 |
| 2011 | 5 | 1 |
| 2012 | 4 | 4 |
| 2013 | 5 | 4 |
| 2014 | 6 | 4 |
| 2015 | 8 | 11 |
| 2016 | 10 | 11 |
| 2017 | 8 | 1 |
| 2018 | 1 | 7 |
| 2019 | 9 | 7 |
| 2020 | 7 | 4 |
| 2021 | 4 | 7 |
| 2022 | 4 | 3 |
| 2023 | 8 | 11 |
| 2024 | 2 | 9 |
| 2025 | 8 | 9 |
| 2026 | 1 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Ion implantation method, ion implanter, and method for manufacturing semiconductor device11 Nov 2025US 12,469,677 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Electron beam application device7 Oct 2025US 12,437,958 B2Hitachi High-Tech Corporation
- Method for ion implantation uniformity control22 Jul 2025US 12,368,018 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Particle beam column15 Jul 2025US 12,362,129 B2Carl Zeiss Microscopy GmbH
- Method, apparatus and system for characterizing energetic neutral component of a particle beam24 Sep 2026US 2026/0290741 A1Axcelis Technologies, Inc.
- Faraday apparatus and ion implanter including faraday apparatus10 Sep 2026US 2026/0269179 A1Nissin Ion Equipment Co., Ltd.
- Multi-charged particle beam irradiation apparatus and alignment method27 Aug 2026US 2026/0253836 A1NuFlare Technology, Inc.
- Line edge smoothing with jittered twist13 Aug 2026US 2026/0237589 A1Axcelis Technologies, Inc.
- A new design concept of scanning electron microscope with charged particle source30 Jul 2026US 2026/0221383 A1ASML Netherlands B. V.
Most cited
By later US patents
- Compensation of dose inhomogeneity using overlapping exposure spots26US 9,495,499 B2IMS Nanofabrication GmbH · 2016
- Extraction electrode system for high current ion implanter11US 7,915,597 B2Axcelis Technologies, Inc. · 2011
- Scanning electron microscope8US 5,731,580 AHitachi, Ltd. · 1998
- Ion implantation apparatus and control method thereof7US 8,692,216 B2Sen Corporation · 2014
- High energy ion implanter, beam current adjuster, and beam current adjustment method7US 9,269,541 B2Sumitomo Heavy Industries Ion Technology Co., Ltd. · 2016