High energy ion implanter, beam current adjuster, and beam current adjustment method
AssigneeSumitomo Heavy Industries Ion Technology Co., Ltd.
InventorsKouji Inada, Kouji Kato
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Abstract
A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.
Claims14
A high energy ion implanter comprising:
- a high energy multistage linear acceleration unit;
- a beamline component arranged upstream or downstream of the high energy multistage linear acceleration unit to form a focus point of an ion beam;
- and
- a variable aperture device disposed at the focus point or a vicinity thereof to adjust a beam width of the ion beam in a direction perpendicular to a focusing direction of the ion beam at the focus point in order to control an implanting beam current.
A beam current adjustment method for a high energy ion implanter with a high energy multistage linear acceleration unit, comprising:
- focusing an ion beam at a focus point formed upstream or downstream of the high energy multistage linear acceleration unit;
- and
- adjusting a beam width of the ion beam in a direction perpendicular to a focusing direction of the ion beam by using a variable aperture device disposed at the focus point or a vicinity thereof in order to control an implanting beam current.
Dependencies are inferred from the claim text.