Back to results
US 2026/0269179 A1Published application
Faraday apparatus and ion implanter including faraday apparatus
AssigneeNissin Ion Equipment Co., Ltd.
InventorsHiroaki KAI, Daiki TAKASHIMA
Life of this patent
Estimating the term…
Abstract
A faraday apparatus includes a mask having an opening through which an ion beam passes, a front plate that contacts the mask and has a first coolant flow path through which a coolant flows, a faraday cup disposed downstream of the front plate, and a back plate disposed downstream of the faraday cup and having a second coolant flow path through which a coolant flows. The front plate is disposed at a position at which the ion beam that is irradiated onto the mask does not irradiate the front plate.
Claims18
A faraday apparatus comprising:
- a mask having an opening through which an ion beam passes;
- a front plate that contacts the mask and has a first coolant flow path through which a coolant flows;
- a faraday cup disposed downstream of the front plate;
- and
- a back plate disposed downstream of the faraday cup and having a second coolant flow path through which a coolant flows,
- wherein the front plate is disposed at a position at which the ion beam that is irradiated onto the mask does not irradiate the front plate.
3 more elements
A faraday apparatus comprising:
- a mask having a plurality of openings through which an ion beam passes;
- a front plate that contacts the mask, has a plurality of holes that correspond respectively to the plurality of openings, and has a first coolant flow path through which a coolant flows;
- a plurality of faraday cups that correspond respectively to the plurality of openings and that are disposed downstream of the front plate;
- and
- a back plate that are disposed downstream of the plurality of faraday cups and that have a second coolant flow path through which a coolant flows,
- wherein the front plate is entirely covered by the mask.
3 more elements
Dependencies are inferred from the claim text.