H01J 2237/21
Focus adjustment
H01J2237/21 (Focus adjustment) appears on 313 US grants and 354 published applications in this corpus.
Search patents in H01J- Granted patents
- 313
- Published applications
- 354
- Assignees
- 86
- Inventors
- 694
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 2 |
| 2002 | 3 | 4 |
| 2003 | 6 | 8 |
| 2004 | 7 | 11 |
| 2005 | 10 | 18 |
| 2006 | 15 | 20 |
| 2007 | 11 | 21 |
| 2008 | 21 | 21 |
| 2009 | 10 | 20 |
| 2010 | 19 | 15 |
| 2011 | 13 | 8 |
| 2012 | 18 | 9 |
| 2013 | 7 | 11 |
| 2014 | 15 | 9 |
| 2015 | 10 | 9 |
| 2016 | 6 | 6 |
| 2017 | 3 | 5 |
| 2018 | 7 | 8 |
| 2019 | 15 | 19 |
| 2020 | 12 | 18 |
| 2021 | 17 | 19 |
| 2022 | 14 | 20 |
| 2023 | 14 | 21 |
| 2024 | 12 | 24 |
| 2025 | 15 | 12 |
| 2026 | 13 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle beam apparatus25 Aug 2026US 12,719,013 B2Hitachi High-Tech Corporation
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Autofocus method for single beam and multi-beam systems26 May 2026US 12,640,337 B2KLA Corporation
- Electron microscope, aberration correction method, and imaging method26 May 2026US 12,640,339 B2JEOL Ltd.
- Automatic electron beam calibration on periodic nanostructures28 Apr 2026US 12,614,693 B2Snap Inc.
- Analyzer and Analysis Method27 Aug 2026US 2026/0251596 A1JEOL Ltd.
- Method for operating a multiple particle beam system, calibration method for a multiple particle beam system, computer program product and multiple particle beam system with increased performance6 Aug 2026US 2026/0229444 A1
- Charged particle beam inspection apparatus and method23 Jul 2026US 2026/0213118 A1ASML Netherlands B. V.
- Automatic electron beam calibration on periodic nanostructures23 Jul 2026US 2026/0213121 A1Snap Inc.
- Astigmatism correction method of electron beam imaging device, product and apparatus2 Jul 2026US 2026/0188606 A1Dongfang Jingyuan Electron Limited
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Automatic focusing system for scanning electron microscope equipped with laser defect detection function103US 6,621,082 B2Seiko Instruments Inc. · 2003
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Image-formation apparatus using charged particle beams under various focus conditions68US 6,538,249 B1Hitachi, Ltd. · 2003
- Ion beam lithography system54US 6,924,493 B1The Regents of the University of California · 2005