H01J 2237/06
Sources
H01J2237/06 (Sources) appears on 1,902 US grants and 1,980 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,902
- Published applications
- 1,980
- Assignees
- 560
- Inventors
- 3,143
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 7 | 0 |
| 1985 | 3 | 0 |
| 1986 | 5 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 4 | 0 |
| 1990 | 5 | 0 |
| 1991 | 7 | 0 |
| 1992 | 9 | 0 |
| 1993 | 8 | 0 |
| 1994 | 15 | 0 |
| 1995 | 13 | 0 |
| 1996 | 21 | 0 |
| 1997 | 15 | 0 |
| 1998 | 22 | 0 |
| 1999 | 18 | 0 |
| 2000 | 20 | 0 |
| 2001 | 16 | 18 |
| 2002 | 19 | 36 |
| 2003 | 34 | 39 |
| 2004 | 37 | 48 |
| 2005 | 33 | 50 |
| 2006 | 48 | 60 |
| 2007 | 37 | 86 |
| 2008 | 55 | 88 |
| 2009 | 66 | 123 |
| 2010 | 87 | 106 |
| 2011 | 74 | 85 |
| 2012 | 85 | 82 |
| 2013 | 93 | 92 |
| 2014 | 95 | 81 |
| 2015 | 96 | 140 |
| 2016 | 110 | 101 |
| 2017 | 100 | 83 |
| 2018 | 70 | 75 |
| 2019 | 94 | 87 |
| 2020 | 103 | 89 |
| 2021 | 72 | 77 |
| 2022 | 62 | 88 |
| 2023 | 69 | 88 |
| 2024 | 69 | 70 |
| 2025 | 69 | 52 |
| 2026 | 27 | 36 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle gun and charged particle beam apparatus29 Sep 2026US 12,749,643 B2Hitachi High-Tech Corporation
- Electron beam applicator and creation method of detection data in electron beam applicator15 Sep 2026US 12,738,441 B2Photo electron Soul Inc.
- Spin-polarized scanning electron microscope8 Sep 2026US 12,731,760 B2Hitachi High-Tech Corporation
- Electron emission methods to generate electron beams with a narrow energy distribution25 Aug 2026US 12,719,005 B2The Regents of the University of California
- Ion source containing a sputter target25 Aug 2026US 12,719,007 B2APPLIED Materials.Inc.
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Non-uniform subsrate processing using a scanned spot ion beam10 Sep 2026US 2026/0269168 A1APPLIED Materials.Inc.
- Applied electron beam device and electron beam generation method3 Sep 2026US 2026/0260838 A1Hitachi High-Tech Corporation
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
- Electron Beam Application Device20 Aug 2026US 2026/0245828 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same425US 7,799,706 B2Sungkyunkwan University Foundation for Corporate Collaboration · 2010
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992
- Beam processing apparatus350US 6,849,857 B2Ebara Corporation · 2005
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984