H01J 2237/061
Construction
H01J2237/061 (Construction) appears on 300 US grants and 336 published applications in this corpus.
Search patents in H01J- Granted patents
- 300
- Published applications
- 336
- Assignees
- 149
- Inventors
- 676
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 2 |
| 2003 | 3 | 3 |
| 2004 | 3 | 6 |
| 2005 | 4 | 6 |
| 2006 | 6 | 6 |
| 2007 | 3 | 7 |
| 2008 | 6 | 16 |
| 2009 | 13 | 25 |
| 2010 | 11 | 17 |
| 2011 | 16 | 16 |
| 2012 | 13 | 19 |
| 2013 | 17 | 7 |
| 2014 | 11 | 4 |
| 2015 | 10 | 16 |
| 2016 | 16 | 20 |
| 2017 | 12 | 11 |
| 2018 | 11 | 10 |
| 2019 | 15 | 15 |
| 2020 | 19 | 16 |
| 2021 | 16 | 24 |
| 2022 | 17 | 21 |
| 2023 | 17 | 23 |
| 2024 | 16 | 19 |
| 2025 | 25 | 15 |
| 2026 | 8 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Ion source containing a sputter target25 Aug 2026US 12,719,007 B2APPLIED Materials.Inc.
- Ion generation device and ion implanter18 Aug 2026US 12,712,144 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Cooled sputtering target for ion source4 Aug 2026US 12,700,560 B2APPLIED Materials.Inc.
- Ion source16 Jun 2026US 12,658,400 B2Nissin Ion Equipment Co., Ltd.
- Vaporizer and ion source12 May 2026US 12,626,888 B2Nissin Ion Equipment Co., Ltd.
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Ion generation apparatus9 Jul 2026US 2026/0196437 A1Fidelity semiconductor CORPORATION
- Electron emission source18 Jun 2026US 2026/0171342 A1Infovion Inc.
- Gas cluster ion beam apparatus4 Jun 2026US 2026/0155330 A1IIPT Inc.
Most cited
By later US patents
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984
- Method for implanting negative hydrogen ion and implanting apparatus190US 6,335,535 B12002
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Apparatus of plural charged-particle beams56US 9,607,805 B2Hermes Microvision, Inc. · 2017
- Charged particle beam apparatus55US 7,582,885 B2Hitachi High-Technologies Corporation · 2009