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US 12,658,400 B2Granted
Ion source
AssigneeNissin Ion Equipment Co., Ltd.
InventorsGeorge Sacco, Sami K. Hahto
Life of this patent
Estimating the term…
Abstract
An ion source includes a vaporizer having a nozzle, and a plasma generation chamber having a projection portion that projects into the plasma generation chamber. The projection portion receives an end portion of the nozzle and includes one or more apertures in fluid communication with an interior of the plasma generation chamber.
Claims17
An ion source comprising:
- a vaporizer comprising a nozzle for discharging vapor;
- and
- a plasma generation chamber that receives the vapor from the vaporizer through the nozzle,
- wherein:
- the nozzle is located outside the plasma generation chamber,
- the plasma generation chamber has a first wall and a second wall that is opposite to the first wall,
- the second wall has a first portion and a second portion which are at different positions from each other in a direction from the first wall to the second wall, and a third portion provided between the first portion and the second portion, and
- at least one of the second portion or the third portion has at least one aperture through which the vapor from the vaporizer enters into the plasma generation chamber.
5 more elements
An ion source comprising:
- a vaporizer configured to generate a vapor and comprising a nozzle for discharging the vapor;
- and
- a plasma generation chamber that receives the vapor from the nozzle, wherein:
- the nozzle is located outside the plasma generation chamber,
- the plasma generation chamber has a first wall and a second wall that is opposite to the first wall,
- the second wall has a projection portion that projects toward the first wall, and
- the projection portion receives the nozzle and has at least one aperture through which the vapor is supplied into the plasma generation chamber.
4 more elements
An ion source comprising:
- a vaporizer comprising a nozzle for discharging vapor;
- and
- a plasma generation chamber comprising:
- a first wall having an ion extraction port;
- and
- a second wall that includes a projection portion that projects into the plasma generation chamber to form a recess in which an end portion of the nozzle is received, the second wall being opposite to the first wall in an axial direction of the nozzle,
- wherein the projection portion comprises at least one aperture in fluid communication with an interior of the plasma generation chamber.
4 more elements
Dependencies are inferred from the claim text.