Non-uniform subsrate processing using a scanned spot ion beam

Abstract

A method of processing a substrate. The method may include subjecting the substrate to a non-uniform exposure, based upon a targeted dose pattern, where the targeted dose pattern is a non-uniform pattern. The non-uniform exposure may include scanning an ion beam with respect to the substrate, along a first direction, while the substrate is scanned along a second direction, different from the first direction, during a first interval. The non-uniform exposure may further include, during a second interval, beam blanking the ion beam while the substrate is scanned along the second direction, wherein an unexposed portion of the substrate remains after the non-uniform exposure and wherein a substrate scan speed differs between the first interval and the second interval.

Dependencies are inferred from the claim text.