Beam processing apparatus
AssigneeEbara Corporation
InventorsKatsunori Ichiki, Kazuo Yamauchi, Hirokuni Hiyama, Seiji Samukawa
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Abstract
A beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), first electrode (4) disposed in the vacuum chamber (3), and a second electrode (5) disposed upstream of the first electrode (4) in the vacuum chamber (3). The beam processing apparatus further comprises a voltage applying unit for applying a variable voltage between the first electrode (4) and the second electrode (5) to alternately extract positive ions (6) and negative ions from the plasma generated by the plasma generator.
Claims10
A beam processing apparatus comprising:
- a workpiece holder for holding a workpiece;
- a plasma generator for generating a plasma in a vacuum chamber, said plasma generator alternately performing application of a high-frequency voltage for generating positive ions and electrons and interruption of said high-frequency voltage for generating negative ions repeatedly;
- a first electrode disposed in said vacuum chamber;
- a second electrode disposed upstream of said first electrode in said vacuum chamber;
- and
- a voltage applying unit for applying a variable voltage between said first electrode and said second electrode to alternately extract positive ions and negative ions from the plasma generated by said plasma generator.
A beam processing apparatus comprising;
- a workpiece holder for holding a workpiece;
- a plasma generator for generating a plasma in a vacuum chamber:
- a negative ion generating chamber disposed downstream of said plasma generator for attaching electrons to a residual gas to generate negative ions therein;
- a first electrode disposed in said vacuum chamber;
- a second electrode disposed upstream of said first electrode in said vacuum chamber;
- and
- a voltage applying unit for applying a variable voltage between said first electrode and said second electrode to alternately extract positive ions and negative ions from the plasma generated by said plasma generator.
A beam processing apparatus comprising:
- a first electrode disposed in a vacuum chamber;
- a workpiece holder disposed downstream of said first electrode for holding a workpiece;
- a second electrode disposed upstream of said first electrode in said vacuum chamber;
- and
- a voltage applying unit for applying a variable voltage between said first electrode and said second electrode to generate a plasma between said first electrode and said second electrode and to alternately extract positive ions and negative ions from the generated plasma.
Dependencies are inferred from the claim text.