H01J 2237/083
Beam forming
H01J2237/083 (Beam forming) appears on 199 US grants and 220 published applications in this corpus.
Search patents in H01J- Granted patents
- 199
- Published applications
- 220
- Assignees
- 101
- Inventors
- 455
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 7 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 3 | 5 |
| 2004 | 2 | 3 |
| 2005 | 1 | 4 |
| 2006 | 5 | 9 |
| 2007 | 2 | 8 |
| 2008 | 6 | 9 |
| 2009 | 5 | 15 |
| 2010 | 17 | 11 |
| 2011 | 9 | 10 |
| 2012 | 10 | 7 |
| 2013 | 9 | 8 |
| 2014 | 6 | 1 |
| 2015 | 1 | 4 |
| 2016 | 6 | 14 |
| 2017 | 15 | 16 |
| 2018 | 6 | 8 |
| 2019 | 16 | 16 |
| 2020 | 17 | 17 |
| 2021 | 6 | 7 |
| 2022 | 10 | 15 |
| 2023 | 8 | 10 |
| 2024 | 11 | 7 |
| 2025 | 9 | 8 |
| 2026 | 2 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Grid structures of ion beam etching (IBE) systems3 Feb 2026US 12,542,254 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly23 Dec 2025US 12,505,979 B2Canon Anelva Corporation
- Apparatus and method for milling sample30 Sep 2025US 12,431,323 B2JEOL Ltd.
- Optical system adjustment method for multi charged particle beam apparatus and computer readable recording medium2 Sep 2025US 12,406,828 B2NuFlare Technology, Inc.
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Ion beam source apparatus, ion beam processing system, and ion beam processing method28 May 2026US 2026/0148922 A1Samsung Electronics Co., Ltd.
- Ultra fast pulser for low energy electron beams21 May 2026US 2026/0142118 A1Euclid Techlabs, LLC
- Grid structures of ion beam etching (ibe) systems21 May 2026US 2026/0142123 A1Taiwan Semiconductor Manufacturing Company.Ltd
- System and method for high angle ion beam7 May 2026US 2026/0128253 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Apparatus of plural charged-particle beams56US 9,607,805 B2Hermes Microvision, Inc. · 2017
- Ion source47US 7,767,977 B1Varian Semiconductor Equipment Associates, Inc. · 2010
- Loadlock assembly for an ion implantation system43US 5,751,003 AEaton Corporation · 1998
- Focused ion beam system42US 5,945,677 AThe Regents of the University of California · 1999
- Ion beam source with coated electrode(s)41US 6,815,690 B2Guardian Industries Corp. · 2004