H01J 2237/0835
Variable cross-section or shape
H01J2237/0835 (Variable cross-section or shape) appears on 41 US grants and 49 published applications in this corpus.
Search patents in H01J- Granted patents
- 41
- Published applications
- 49
- Assignees
- 30
- Inventors
- 109
- Latest grant
- 30 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 2 | 4 |
| 2004 | 0 | 2 |
| 2005 | 1 | 2 |
| 2006 | 3 | 4 |
| 2007 | 1 | 4 |
| 2008 | 4 | 3 |
| 2009 | 3 | 6 |
| 2010 | 6 | 3 |
| 2011 | 2 | 3 |
| 2012 | 4 | 2 |
| 2013 | 1 | 3 |
| 2014 | 2 | 0 |
| 2015 | 0 | 1 |
| 2016 | 1 | 2 |
| 2017 | 3 | 2 |
| 2018 | 1 | 0 |
| 2019 | 0 | 2 |
| 2020 | 1 | 0 |
| 2021 | 0 | 0 |
| 2022 | 1 | 2 |
| 2023 | 1 | 2 |
| 2024 | 1 | 2 |
| 2025 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Apparatus and method for milling sample30 Sep 2025US 12,431,323 B2JEOL Ltd.
- System for manufacturing of three dimensional objects19 Nov 2024US 12,145,201 B2Joint Stock Company “Nvo Chervona Hvilya”
- Apparatus of electron beam comprising pinnacle limiting plate and method of reducing electron-electron interaction30 May 2023US 11,664,186 B1Borries Pte. Ltd.
- Electron beam column for three-dimensional printing device, three-dimensional printing device, and three-dimensional printing method4 Oct 2022US 11,458,561 B2Advantest Corporation
- Ion source and ion implantation apparatus25 Feb 2020US 10,573,490 B2Nissin Ion Equipment Co., Ltd.
- Electron gun, electron beam applicator, and emission method of electron beam27 Jun 2024US 2024/0212967 A1Photo electron Soul Inc.
- Particle beam system23 May 2024US 2024/0170248 A1
- Apparatus and Method for Milling Sample22 Jun 2023US 2023/0197401 A1JEOL Ltd.
- Particle beam system with multi-source system and multi-beam particle microscope2 Mar 2023US 2023/0065475 A1
- System and process implementing a wide ribbon beam ion source to implant ions in material to modify material properties10 Nov 2022US 2022/0359157 A1
Most cited
By later US patents
- Selectively shaped field emission electron beam source, and phosphor array for use therewith33US 5,583,393 AFED Corporation · 1996
- Ion implantation ion source, system and method30US 7,022,999 B2SemEquip, Inc. · 2006
- Ion implantation ion source, system and method30US 7,107,929 B2SemEquip, Inc. · 2006
- Ion implantation ion source, system and method26US 7,185,602 B2SemEquip, Inc. · 2007
- Ion implantation ion source, system and method20US 7,112,804 B2SemEquip, Inc. · 2006