Ion source and ion implantation apparatus
AssigneeNissin Ion Equipment Co., Ltd.
InventorTetsuro Yamamoto
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Abstract
An ion source for improving beam transport efficiency regarding a ribbon beam is provided. The plasma generation container is formed with a beam extraction port at an end thereof. The shielding member plugs the beam extraction port and comprises three or more elongate holes each of which is long in a lateral direction of a ribbon beam to be extracted through the shielding member and which are arranged in the form of an array extending in the lateral direction, wherein a first length one of the elongate holes located in a central region of the array is shorter than a second length of one of the remaining elongate holes located on an end side of the array.
Claims14
An ion source comprising:
- a plasma generation container formed with a beam extraction port at an end thereof;
- and
- a shielding member plugging the beam extraction port and comprising three or more elongate holes each of which is long in a lateral direction of a ribbon beam to be extracted through the shielding member and which are arranged in the form of an array extending in the lateral direction, wherein a first length one of the elongate holes located in a central region of the array is shorter than a second length of one of the remaining elongate holes located on an end side of the array.
An ion source comprising:
- a plasma generation container including a beam extraction port;
- and
- a shield provided in the beam extraction port and comprising a first hole, a second hole, and a third hole between the first and second holes, each of the first to third holes having a length that is longer than a width thereof and arranged along a line in a length direction thereof, the length of the third hole being shorter a length of one of the first hole and the second hole.
Dependencies are inferred from the claim text.