Particle beam system with multi-source system and multi-beam particle microscope

A particle beam system, comprising:

• a multi-source system, comprising:
• a particle multi-source configured to generate a multiplicity of charged individual particle beams via field emission;
• a first multi-aperture plate comprising a multiplicity of first openings configured to have the charged individual particle beams at least partly pass therethrough;
• a first multi-lens array comprising a multiplicity of individually adjustable particle lenses, the first multi-lens array downstream of the first multi-aperture plate along a beam path of charged individual particle beams so that the charged individual particle beams which pass through the first multi-aperture plate also pass through the first multi-lens array;
• a second multi-aperture plate comprising a multiplicity of second openings, the second multi-aperture plate downstream of the first multi-lens array along the beam path of charged individual particle beams so that the charged individual particle beams which pass through the first multi-lens array also pass through the second multi-aperture plate;
• a beam current-restricting multi-aperture plate comprising a multiplicity of beam current-restricting openings, the beam current-restricting multi-aperture plate downstream of the second multi-aperture plate along the beam path of charged individual particle beams so that the charged individual particle beams are partly incident on the beam current-restricting multi-aperture plate and absorbed there and partly pass through the openings in the beam current-restricting multi-aperture plate;
• and
• a controller configured to supply an individually adjustable voltage to the particle lenses of the first multi-lens array to individually adjust a focusing of the associated particle lens for each individual particle beam.