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US 7,022,999 B2Granted
Ion implantation ion source, system and method
AssigneeSemEquip, Inc.
InventorsThomas Neil Horsky, John Noel Williams
Life of this patent
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Abstract
A multi mode ion source is disclosed that includes an ion source incorporating an ionization chamber for ionizing gas species and configured to have at least two discrete modes of operation; namely, an arc-discharge mode and a non-arc discharge mode of operation.
Claims31
A multi mode ion source comprising:
- an ion source incorporating an ionization chamber for ionizing gas species and configured to have at least two discrete modes of operation;
- namely, an arc-discharge mode and a non-arc discharge mode of operation.
Dependencies are inferred from the claim text.