H01J 2237/063
Electron sources
H01J2237/063 (Electron sources) appears on 643 US grants and 679 published applications in this corpus.
Search patents in H01J- Granted patents
- 643
- Published applications
- 679
- Assignees
- 274
- Inventors
- 1,341
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 6 | 0 |
| 1995 | 5 | 0 |
| 1996 | 6 | 0 |
| 1997 | 5 | 0 |
| 1998 | 6 | 0 |
| 1999 | 6 | 0 |
| 2000 | 9 | 0 |
| 2001 | 2 | 6 |
| 2002 | 2 | 7 |
| 2003 | 7 | 10 |
| 2004 | 12 | 21 |
| 2005 | 12 | 23 |
| 2006 | 24 | 18 |
| 2007 | 14 | 27 |
| 2008 | 13 | 27 |
| 2009 | 17 | 25 |
| 2010 | 23 | 31 |
| 2011 | 20 | 20 |
| 2012 | 20 | 19 |
| 2013 | 27 | 30 |
| 2014 | 29 | 22 |
| 2015 | 33 | 62 |
| 2016 | 44 | 28 |
| 2017 | 33 | 24 |
| 2018 | 29 | 22 |
| 2019 | 21 | 33 |
| 2020 | 36 | 29 |
| 2021 | 22 | 29 |
| 2022 | 22 | 41 |
| 2023 | 30 | 53 |
| 2024 | 34 | 33 |
| 2025 | 39 | 23 |
| 2026 | 13 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle gun and charged particle beam apparatus29 Sep 2026US 12,749,643 B2Hitachi High-Tech Corporation
- Electron beam applicator and creation method of detection data in electron beam applicator15 Sep 2026US 12,738,441 B2Photo electron Soul Inc.
- Spin-polarized scanning electron microscope8 Sep 2026US 12,731,760 B2Hitachi High-Tech Corporation
- Electron emission methods to generate electron beams with a narrow energy distribution25 Aug 2026US 12,719,005 B2The Regents of the University of California
- Plasma etching apparatus and semiconductor processing system11 Aug 2026US 12,706,274 B2Samsung Electronics Co., Ltd.
- Applied electron beam device and electron beam generation method3 Sep 2026US 2026/0260838 A1Hitachi High-Tech Corporation
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
- Electron Beam Application Device20 Aug 2026US 2026/0245828 A1Hitachi High-Tech Corporation
- Systems and methods for petahertz optoelectronics13 Aug 2026US 2026/0235539 A1Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts
- Remote Surface Wave Propagation for Semiconductor Chamber13 Aug 2026US 2026/0237603 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984
- Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams156US 5,892,224 ANikon Corporation · 1999
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Electron beam exposure system79US 6,897,458 B2Mapper Lithography IP B.V. · 2005