H01J 2237/06375
Arrangement of electrodes
H01J2237/06375 (Arrangement of electrodes) appears on 71 US grants and 87 published applications in this corpus.
Search patents in H01J- Granted patents
- 71
- Published applications
- 87
- Assignees
- 59
- Inventors
- 216
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 4 |
| 2006 | 3 | 0 |
| 2007 | 1 | 2 |
| 2008 | 1 | 5 |
| 2009 | 2 | 2 |
| 2010 | 0 | 6 |
| 2011 | 3 | 2 |
| 2012 | 4 | 4 |
| 2013 | 3 | 2 |
| 2014 | 3 | 1 |
| 2015 | 2 | 5 |
| 2016 | 2 | 4 |
| 2017 | 6 | 7 |
| 2018 | 4 | 4 |
| 2019 | 3 | 4 |
| 2020 | 3 | 3 |
| 2021 | 4 | 1 |
| 2022 | 2 | 10 |
| 2023 | 4 | 12 |
| 2024 | 6 | 2 |
| 2025 | 6 | 2 |
| 2026 | 6 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle gun and charged particle beam apparatus29 Sep 2026US 12,749,643 B2Hitachi High-Tech Corporation
- Plasma etching apparatus and semiconductor processing system11 Aug 2026US 12,706,274 B2Samsung Electronics Co., Ltd.
- Remote surface wave propagation for semiconductor chambers5 May 2026US 12,620,553 B2APPLIED Materials.Inc.
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- System and apparatus for stabilizing electron sources in charged particle systems10 Mar 2026US 12,573,580 B2ASML Netherlands B. V.
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
- Remote Surface Wave Propagation for Semiconductor Chamber13 Aug 2026US 2026/0237603 A1APPLIED Materials.Inc.
- Apparatus and Process for Removal of Surface Oxides18 Jun 2026US 2026/0171343 A1Air Products and Chemicals, Inc.
- Apparatus and method for improved electron beam inspection with a charge treatment electron source30 Apr 2026US 2026/0120989 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Stabilizing a tip wire of an electron source2 Oct 2025US 2025/0308832 A1Applied Materials Israel Ltd.
Most cited
By later US patents
- Electron beam exposure system79US 6,897,458 B2Mapper Lithography IP B.V. · 2005
- Electron beam exposure system43US 7,091,504 B2Mapper Lithography IP B.V. · 2006
- Integrated sub-nanometer-scale electron beam systems17US 7,279,686 B2Biomed Solutions, LLC · 2007
- Non-planar extractor structure for electron source12US 8,513,619 B1KLA-Tencor Corporation · 2013
- Charged-particle source and method for cleaning a charged-particle source using back-sputtering7US 10,840,054 B2IMS Nanofabrication GmbH · 2020